SCHEMBL501640

SCHEMBL501640

CC(=O)OCCn1ccnc1

nearest known ligand 0.54

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
TBXAS1 P24557 15/20 0.54
EGLN3 Q9H6Z9 1/20 0.53
MEN1 O00255 1/20 0.49
LMNA P02545 1/20 0.49
KMT2A Q03164 1/20 0.49
ALDH1A1 P00352 2/20 0.47
KDM4E B2RXH2 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17437797 0.90 ALDH1A1 (0.52) TBXAS1EGLN3MEN1LMNAKMT2A
SCHEMBL15506132 0.90 TBXAS1 (0.54) TBXAS1EGLN3MEN1KMT2A
SCHEMBL15506130 0.88 TBXAS1 (0.56) TBXAS1MEN1LMNAKMT2AKDM4E
SCHEMBL1071597 0.85 TBXAS1 (0.50) TBXAS1EGLN3MEN1LMNAKMT2A
SCHEMBL10072238 0.83 TBXAS1 (0.59) TBXAS1EGLN3MEN1LMNAKMT2A
SCHEMBL8032821 0.83 TBXAS1 (0.50) TBXAS1EGLN3MEN1LMNAKMT2A
SCHEMBL24517734 0.82 EGLN3 (0.53) TBXAS1EGLN3MEN1LMNAKMT2A
SCHEMBL11035419 0.82 ALDH1A1 (0.47) TBXAS1EGLN3KMT2AALDH1A1KDM4E
SCHEMBL7461666 0.81 ALDH1A1 (0.50) TBXAS1EGLN3ALDH1A1
SCHEMBL10656066 0.81 TBXAS1 (0.52) TBXAS1EGLN3MEN1LMNAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 103 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116315029-B Electrolyte and lithium battery containing same 张家港市国泰华荣化工新材料有限公司 2024-03-29 CN claimed
WO-2023116005-A1 NONAQUEOUS ELECTROLYTE AND LITHIUM ION BATTERY CONTAINING SAME 张家港市国泰华荣化工新材料有限公司 2023-06-29 WO claimed
CN-116315029-A Electrolyte and lithium battery containing same 张家港市国泰华荣化工新材料有限公司 2023-06-23 CN claimed
CN-111303040-A Method for preparing imidazole-1-acetic acid by one-pot method 武汉工程大学 2020-06-19 CN claimed
CN-116315029-B Electrolyte and lithium battery containing same 张家港市国泰华荣化工新材料有限公司 2024-03-29 CN disclosed
CN-116315083-B Nonaqueous electrolyte and lithium ion battery containing same 张家港市国泰华荣化工新材料有限公司 2024-03-01 CN disclosed
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 US disclosed
US-20230205083-A1 SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-29 US disclosed
US-20230205083-A1 SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-06-29 US disclosed
WO-2023116005-A1 NONAQUEOUS ELECTROLYTE AND LITHIUM ION BATTERY CONTAINING SAME 张家港市国泰华荣化工新材料有限公司 2023-06-29 WO disclosed
CN-116315083-A Nonaqueous electrolyte and lithium ion battery containing same 张家港市国泰华荣化工新材料有限公司 2023-06-23 CN disclosed
CN-116315029-A Electrolyte and lithium battery containing same 张家港市国泰华荣化工新材料有限公司 2023-06-23 CN disclosed
US-20090246686-A1 POLYMER, POLYMER PREPARATION METHOD, RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-10-01 US disclosed
US-20090202485-A1 HETEROARYL-CONTAINING TRIPEPTIDE HCV SERINE PROTEASE INHIBITORS ENANTA PHARMACEUTICALS, INC. 2009-08-13 US disclosed
EP-2033966-A2 Movel photoacid generators, resist compositons, and patterning processes Shin-Etsu Chemical Co., Ltd. (JP) 2009-03-11 EP disclosed
US-20090061358-A1 NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS PROXIMAL SYSTEMS CORPORATION 2009-03-05 US disclosed
WO-2008098886-A2 METHOD FOR PRODUCING (METH)ACRYLATES OF N-HYDROXYALKYLATED IMIDAZOLES BASF SE (DE) 2008-08-21 WO disclosed
US-20080102405-A1 Nitrogen-containing organic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2008-05-01 US disclosed
US-7141351-B2 Basic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2006-11-28 US disclosed
US-20040234884-A1 Basic compound, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-11-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230205083-A1 SALT COMPOUND, RESIST COMPOSITION AND PATTERNING PROCESS SLC6A9, SLC6A5, REN TBXAS1 4437/4885EGLN3 4518/4885MEN1 3242/4885
US-20080102405-A1 Nitrogen-containing organic compound, resist composition and patterning process MDM4, MUS81, NOP2 TBXAS1 2649/4885EGLN3 1123/4885MEN1 1226/4885
US-20090061358-A1 NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS RER1, CRY1, CYP21A2 TBXAS1 1300/4885EGLN3 419/4885MEN1 718/4885
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process IDUA, SLC6A5, SLC6A9 TBXAS1 4636/4885EGLN3 4826/4885MEN1 3334/4885
US-20090202485-A1 HETEROARYL-CONTAINING TRIPEPTIDE HCV SERINE PROTEASE INHIBITORS PRSS1, CTSC, SPINT2 TBXAS1 3050/4885EGLN3 2154/4885MEN1 4578/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.