SCHEMBL5031604

SCHEMBL5031604

C=Cc1ccc(C(=O)Nc2cccc(C)c2O)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.50
HPGD P15428 1/20 0.50
MAPT P10636 3/20 0.47
HDAC2 Q92769 1/20 0.46
NPC1 O15118 6/20 0.45
RAB9A P51151 6/20 0.45
SMN1; SMN2 Q16637 3/20 0.45
HTT P42858 3/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
TAS1R3 Q7RTX0 1/20 0.43
TAS1R1 Q7RTX1 1/20 0.43
KDM4E B2RXH2 1/20 0.42
ALDH1A1 P00352 1/20 0.42
MEN1 O00255 3/20 0.41
KMT2A Q03164 3/20 0.41
F10 P00742 1/20 0.41
LMNA P02545 1/20 0.40
TP53 P04637 1/20 0.40
TSHR P16473 1/20 0.40
HSD17B10 Q99714 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28734392 0.81 RAB9A (0.62) POLBHPGDMAPTNPC1RAB9A
SCHEMBL5034820 0.79 NPC1 (0.64) POLBHDAC2NPC1RAB9AHTT
SCHEMBL10057814 0.77 TOP1 (0.69) POLBHPGDMAPTNPC1RAB9A
SCHEMBL14075504 0.75 HDAC1 (0.68) HDAC2NPC1RAB9A
SCHEMBL5031608 0.74 KCNMA1 (0.68) MAPTHDAC2NPC1RAB9ASMN1; SMN2
SCHEMBL5033736 0.74 NPC1 (0.54) HPGDMAPTHDAC2NPC1RAB9A
SCHEMBL4285958 0.74 CASP3 (0.52) POLBHPGDMAPTHDAC2HTT
SCHEMBL3282351 0.74 HDAC2 (0.45) POLBHDAC2NPC1RAB9ATAS1R3
SCHEMBL14030893 0.74 ALDH1A1 (0.48) POLBHPGDMAPTHDAC2NPC1
SCHEMBL7599567 0.74 KDM4E (0.44) POLBHPGDHDAC2NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7439005-B2 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2008-10-21 US disclosed
US-7439005-B2 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2008-10-21 US disclosed
US-7439005-B2 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2008-10-21 US disclosed
US-20070134586-A1 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2007-06-14 US disclosed
US-20070134586-A1 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2007-06-14 US disclosed
US-20070134586-A1 Styrene derivative, styrene polymer, photosensitive resin composition, and method for forming pattern NEC CORPORATION (JP) 2007-06-14 US disclosed