Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Edetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACE known ✓ | P12821 | 1/20 | 0.88 |
| ▸ | CHRM2 known ✓ | P08172 | 1/20 | 0.82 |
| ▸ | ADRA2A known ✓ | P08913 | 1/20 | 0.82 |
| ▸ | SLC6A2 known ✓ | P23975 | 1/20 | 0.82 |
| ▸ | SLC6A4 known ✓ | P31645 | 1/20 | 0.82 |
| ▸ | ADRA1A known ✓ | P35348 | 1/20 | 0.82 |
| ▸ | DRD3 known ✓ | P35462 | 1/20 | 0.82 |
| ▸ | SLC6A3 known ✓ | Q01959 | 1/20 | 0.82 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.88 |
| ▸ | EYA2 | O00167 | 1/20 | 0.88 |
| ▸ | APP | P05067 | 1/20 | 0.88 |
| ▸ | BLM | P54132 | 2/20 | 0.82 |
| ▸ | PMP22 | Q01453 | 2/20 | 0.82 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.82 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.82 |
| ▸ | TSHR | P16473 | 2/20 | 0.82 |
| ▸ | LMNA | P02545 | 1/20 | 0.82 |
| ▸ | DRD1 | P21728 | 1/20 | 0.82 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.82 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.82 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Edetic Acid SCHEMBL3973738 | 1.00 | TDP1 (0.88) | TDP1EYA2APPACEBLM | |
| Edetic Acid SCHEMBL10415818 | 1.00 | TDP1 (0.88) | TDP1EYA2APPACEBLM | |
| Edetic Acid SCHEMBL5718897 | 1.00 | TDP1 (0.88) | TDP1EYA2APPACEBLM | |
| Edetic Acid SCHEMBL3973748 | 1.00 | TDP1 (0.88) | TDP1EYA2APPACEBLM | |
| Edetic Acid SCHEMBL8361892 | 1.00 | TDP1 (0.88) | TDP1EYA2APPACEBLM | |
| Edetic Acid SCHEMBL9864736 | 0.97 | TDP1 (0.82) | TDP1EYA2APPACEBLM | |
| Edetic Acid SCHEMBL8658392 | 0.97 | TDP1 (0.82) | TDP1EYA2APPACEBLM | |
| Edetic Acid SCHEMBL8044889 | 0.97 | TDP1 (0.82) | TDP1EYA2APPACEBLM | |
| Edetic Acid SCHEMBL9751865 | 0.97 | TDP1 (0.82) | TDP1EYA2APPACEBLM | |
| Edetic Acid SCHEMBL9796993 | 0.97 | TDP1 (0.82) | TDP1EYA2APPACEBLM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115976586-A | Positive and negative pulse electrolytic nickel-tungsten alloy solution, preparation method, electroplating method and nickel-tungsten alloy coating | 昆山一鼎工业科技有限公司 | 2023-04-18 | — | — | CN | claimed |
| US-6926936-B2 | Ink-jet recording sheet with improved ozone resistance | FELIX SCHOELLER JR. FOTO-UND SPEZIALPAPIERE GMBH & CO. KG (DE) | 2005-08-09 | — | — | US | claimed |
| US-20030219611-A1 | Ink-jet recording sheet with improved ozone resistance | FELIX SCHOELLER JR. FOTO-UND SPEZIALPAPIERE GMBH & CO. KG | 2003-11-27 | — | — | US | claimed |
| EP-1364803-A1 | Ink-Jet recording material with improved ozone resistance | Felix Schoeller jr Foto- und Spezialpapiere GmbH & Co. KG (DE) | 2003-11-26 | — | — | EP | claimed |
| US-12292363-B2 | Method for preparing biological material having excellent light-transmitting property | RIKEN (JP) | 2025-05-06 | — | — | US | disclosed |
| EP-4340056-A1 | POSITIVE ELECTRODE MIXTURE, POSITIVE ELECTRODE AND SECONDARY BATTERY | Daikin Industries, Ltd. (JP) | 2024-03-20 | — | — | EP | disclosed |
| US-20240088381-A1 | POSITIVE ELECTRODE MIXTURE, POSITIVE ELECTRODE AND SECONDARY BATTERY | DAIKIN INDUSTRIES, LTD. (JP) | 2024-03-14 | — | — | US | disclosed |
| EP-4336584-A1 | POSITIVE ELECTRODE MIXTURE, POSITIVE ELECTRODE AND SECONDARY BATTERY | Daikin Industries, Ltd. (JP) | 2024-03-13 | — | — | EP | disclosed |
| US-20240079595-A1 | POSITIVE ELECTRODE MIXTURE, POSITIVE ELECTRODE AND SECONDARY BATTERY | DAIKIN INDUSTRIES, LTD. (JP) | 2024-03-07 | — | — | US | disclosed |
| CN-117202784-A | Antimicrobial compounds and solutions, uses thereof, and methods of making the same | 宇天新技术有限公司 | 2023-12-08 | — | — | CN | disclosed |
| CN-115976586-A | Positive and negative pulse electrolytic nickel-tungsten alloy solution, preparation method, electroplating method and nickel-tungsten alloy coating | 昆山一鼎工业科技有限公司 | 2023-04-18 | — | — | CN | disclosed |
| CN-115452930-A | Method for simultaneously determining 12 heavy metal elements in high-salt food | 汕头海关技术中心 | 2022-12-09 | — | — | CN | disclosed |
| US-20220381657-A1 | METHOD FOR PREPARING BIOLOGICAL MATERIAL HAVING EXCELLENT LIGHT-TRANSMITTING PROPERTY | RIKEN (JP) | 2022-12-01 | — | — | US | disclosed |
| WO-2022167909-A1 | ANTIMICROBIAL COMPOUNDS AND SOLUTIONS, USES THEREOF AND METHODS OF MAKING THE SAME | UT INNOVATION LIMITED (CN) | 2022-08-11 | — | — | WO | disclosed |
| CN-103936087-B | Mixed blue-green algae treating agent | WUHU KAIAOER ENVIRONMENTAL PROT TECHNOLOGY CO LTD | 2015-04-08 | — | — | CN | disclosed |
| CN-103936087-A | Mixed blue-green algae treating agent and preparation method thereof | WUHU KAIAOER ENVIRONMENTAL PROT TECHNOLOGY CO LTD | 2014-07-23 | — | — | CN | disclosed |
| US-7196211-B2 | Hafnium-containing material for film formation, method for producing the same, and method for producing hafnium-containing thin film using the same | MITSUBISHI MATERIALS CORPORATION (JP) | 2007-03-27 | — | — | US | disclosed |
| US-20050065358-A1 | Hafnium-containing material for film formation, method for producing the same, and method for producing hafnium-containing thin film using the same | MITSUBISHI MATERIALS CORPORATION (JP) | 2005-03-24 | — | — | US | disclosed |
| EP-1364803-A1 | Ink-Jet recording material with improved ozone resistance | Felix Schoeller jr Foto- und Spezialpapiere GmbH & Co. KG (DE) | 2003-11-26 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20050065358-A1 | Hafnium-containing material for film formation, method for producing the same, and method for producing hafnium-containing thin film using the same | PUF60, HAO2, RTF1 | ACE 4432/4885CHRM2 4584/4885ADRA2A 4665/4885 |
| US-20240079595-A1 | POSITIVE ELECTRODE MIXTURE, POSITIVE ELECTRODE AND SECONDARY BATTERY | MLX, AFF2, PYM1 | ACE 4652/4885CHRM2 419/4885ADRA2A 3340/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.