SCHEMBL545273

SCHEMBL545273

O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F.[Na+]

nearest known ligand 0.58

Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CA2 known ✓ P00918 14/20 0.58
CA1 known ✓ P00915 13/20 0.54
THRB known ✓ P10828 1/20 0.33
MMP1 P03956 3/20 0.54
MMP2 P08253 3/20 0.54
MMP9 P14780 3/20 0.54
MMP8 P22894 3/20 0.54
MMP13 P45452 3/20 0.54
F2 P00734 4/20 0.43
PRSS1 P07477 4/20 0.43
PRSS2 P07478 4/20 0.43
PRSS3 P35030 4/20 0.43
LMNA P02545 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5486099 1.00 CA2 (0.58) CA2CA1MMP1MMP2MMP9
SCHEMBL28387976 1.00 CA2 (0.58) CA2CA1MMP1MMP2MMP9
SCHEMBL30150687 1.00 CA2 (0.58) CA2CA1MMP1MMP2MMP9
SCHEMBL19811134 1.00 CA2 (0.58) CA2CA1MMP1MMP2MMP9
SCHEMBL866860 1.00 CA2 (0.58) CA2CA1MMP1MMP2MMP9
SCHEMBL28481746 1.00 CA2 (0.58) CA2CA1MMP1MMP2MMP9
SCHEMBL31119340 1.00 CA2 (0.58) CA2CA1MMP1MMP2MMP9
SCHEMBL814004 1.00 CA2 (0.58) CA2CA1MMP1MMP2MMP9
SCHEMBL3684248 1.00 CA2 (0.58) CA2CA1MMP1MMP2MMP9
SCHEMBL5069432 1.00 CA2 (0.58) CA2CA1MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 933 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4748882-A1 NON-HALOGENATED HIGHLY FLAME RETARDANT COMPOSITE THERMOPLASTIC RESIN COMPOSITIONS CONTAINING RECYCLED RESINS AND MOLDED ARTICLES MADE THEREFROM Hanwha TotalEnergies Petrochemical Co., Ltd. (KR) 2026-05-27 EP claimed
CN-122080523-A Halogen-free high flame retardant composite thermoplastic resin composition containing recycled resin and molded article made therefrom 2026-05-26 CN claimed
CN-122061228-A Construction process and application of long-acting anti-corrosion crystallization-preventing composite coating for metal component 青岛蔚蓝金属制品有限公司 2026-05-19 CN claimed
CN-121493953-B Preparation method of single-walled carbon nanotube slurry, single-walled carbon nanotube slurry and application thereof 上海沪正实业有限公司 2026-05-12 CN claimed
US-20250353752-A1 PREPARATION METHOD FOR SILICON DIOXIDE AEROGEL AND SILICON DIOXIDE AEROGEL HUNAN ALFY NEW MAT CO LTD (CN) 2025-11-20 US claimed
CN-120138809-A Silicon carbide crystal growth method 安徽微芯长江半导体材料有限公司 2025-06-13 CN claimed
US-20250179273-A1 Flame-Retardant Polypropylene Resin Composition With Excellent Moisture Heat Resistance Stability And Article Molded Therefrom HANWHA TOTALENERGIES PETROCHEMICAL CO., LTD. (KR) 2025-06-05 US claimed
CN-119736090-A Low-alkali crystalline silicon etching liquid additive, etching liquid and method 武汉风帆电化科技股份有限公司 2025-04-01 CN claimed
CN-119264715-A Anti-oil-dirt self-cleaning paint for photovoltaic panel and preparation method thereof 广州新意新材料科技有限公司 2025-01-07 CN claimed
CN-119132842-A Electrode material of sodium ion mixed supercapacitor, preparation method of electrode material and supercapacitor 东风汽车集团股份有限公司 2024-12-13 CN claimed
US-20090042390-A1 ETCHANT FOR SILICON WAFER SURFACE SHAPE CONTROL AND METHOD FOR MANUFACTURING SILICON WAFERS USING THE SAME SUMCO CORPORATION (JP) 2009-02-12 US claimed
US-20090043023-A1 Flame resistant polycarbonate composition BAYER MATERIALSCIENCE LLC 2009-02-12 US claimed
CN-1898328-A Polycarbonate compositions GEN ELECTRIC (US) 2007-01-17 CN claimed
CN-1272382-C Flame retardant resinous compositions and method GEN ELECTRIC (US) 2006-08-30 CN claimed
US-6130028-A OF AROMATIC/HETEROCYCLIC ALDEHYDES, ACETALS OR HEMIACETALS AND A MIXTURE OF A NONIONIC POLYETHOXYLATED NONFLUORINATED SURFACTANT AND A NONIONIC OR ANIONIC FLUORINATED ONE; ANTISOILANTS, NONTACKY, WEAR RESISTANCE; MAGNETIC BACKING EASTMAN KODAK COMPANY (US) 2000-10-10 US claimed
US-6022674-A USING SURFACTANT MIXTURE EASTMAN KODAK COMPANY (US) 2000-02-08 US claimed
US-5968716-A SILVER HALIDE EMULSIONS WITH DYE IMAGES, SURFACTANTS OF GLYCOLS EASTMAN KODAK COMPANY (US) 1999-10-19 US claimed
EP-0935167-A2 Photographic stabilizing processing solution and method of use EASTMAN KODAK COMPANY (US) 1999-08-11 EP claimed
US-5242973-A Trihalophenoxy terminated polycarbonate resin composition containing salt of organic sulfonic acid IDEMITSU PETROCHEMICAL CO., LTD. (JP) 1993-09-07 US claimed
US-3966660-A Method for preparing vinyl fluoride-hexafluoro-propylene resin and method for producing a coating therefrom TEIJIN LIMITED (JA) 1976-06-29 US claimed