SCHEMBL5529294

SCHEMBL5529294

CC(O)NS(=O)(=O)[O-].[Na+]

nearest known ligand 0.00

Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2589330 0.77
SCHEMBL126513 0.72
Sulfuric Acid SCHEMBL28159484 0.72 ALDH1A1 (0.47)
Potassium Ion SCHEMBL4593005 0.71
SCHEMBL3425587 0.71
SCHEMBL4444546 0.71
Sulfuric Acid SCHEMBL28868311 0.69 ALDH1A1 (0.44)
SCHEMBL364400 0.69
SCHEMBL1408449 0.69
SCHEMBL5528868 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104263169-A Moisture-resistant reflective thermal insulation coating and preparation method thereof SUZHOU ZHONGLI RONGCHUANG NEW BUILDING MATERIAL CO LTD 2015-01-07 CN claimed
CN-104263168-A Water-in-water multicolor paint and preparation method thereof SUZHOU ZHONGLI RONGCHUANG NEW BUILDING MATERIAL CO LTD 2015-01-07 CN claimed
CN-104263188-A Epoxy flooring coating with high wear resistance, and preparation method thereof SUZHOU ZHONGLI RONGCHUANG NEW BUILDING MATERIAL CO LTD 2015-01-07 CN claimed
EP-2832754-B1 VINYL RESIN AND RESIN COMPOSITION SANYO CHEMICAL IND LTD (JP) 2020-10-28 EP disclosed
CN-105997703-A Olive leaf extract and cosmetics containing same 上海相宜本草化妆品股份有限公司 2016-10-12 CN disclosed
CN-105395458-A Herbal composition and application thereof SHANGHAI INOHERB COSMETIC CO LTD 2016-03-16 CN disclosed
US-20150119497-A1 VINYL RESIN AND RESIN COMPOSITION SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2015-04-30 US disclosed
EP-2832754-A1 VINYL RESIN AND RESIN COMPOSITION Sanyo Chemical Industries, Ltd. (JP) 2015-02-04 EP disclosed
CN-104277567-A Highly dispersed luminous aluminum pigment and preparation method thereof HEFEI SUNRISE PIGMENTS CO LTD 2015-01-14 CN disclosed
CN-104263188-A Epoxy flooring coating with high wear resistance, and preparation method thereof SUZHOU ZHONGLI RONGCHUANG NEW BUILDING MATERIAL CO LTD 2015-01-07 CN disclosed
CN-104263168-A Water-in-water multicolor paint and preparation method thereof SUZHOU ZHONGLI RONGCHUANG NEW BUILDING MATERIAL CO LTD 2015-01-07 CN disclosed
CN-104263169-A Moisture-resistant reflective thermal insulation coating and preparation method thereof SUZHOU ZHONGLI RONGCHUANG NEW BUILDING MATERIAL CO LTD 2015-01-07 CN disclosed
CN-100494260-C Agent for suppressing transfer of odor and taste originating from a diacetal, a diacetal composition comprising the agent for suppressing transfer of odor and taste, a polyolefin nucleating agent comp NEW JAPAN CHEM CO LTD (JP) 2009-06-03 CN disclosed
US-20070269987-A1 Polishing Liquid for Cmp Process and Polishing Method SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2007-11-22 US disclosed
US-7150868-B2 Composition for blending to hair treating agent and hair treating agent SAN-EI KAGAKU CO., LTD. (JP) 2006-12-19 US disclosed
EP-1628334-A1 POLISHING LIQUID FOR CMP PROCESS AND POLISHING METHOD SANYO CHEMICAL INDUSTRIES LTD. (JP) 2006-02-22 EP disclosed
US-20050196367-A1 Composition for blending to hair treating agent and hair treating agent OHTA TOSHIO (JP) 2005-09-08 US disclosed
CN-1649951-A Agent for suppressing transfer of odor and taste originating from a diacetal, a diacetal composition comprising the agent for suppressing transfer of odor and taste, a polyolefin nucleating agent comp NEW JAPAN CHEM CO LTD (JP) 2005-08-03 CN disclosed