Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.34 |
| ▸ | MLYCD | O95822 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25276314 | 0.97 | MLYCD (0.36) | ALDH1A1PAX8MLYCD | |
| SCHEMBL30412178 | 0.94 | ALDH1A1 (0.37) | ALDH1A1PAX8MLYCD | |
| SCHEMBL13683405 | 0.86 | ALDH1A1 (0.32) | ALDH1A1MLYCD | |
| SCHEMBL19619702 | 0.84 | ALDH1A1 (0.30) | ALDH1A1MLYCD | |
| SCHEMBL1813722 | 0.83 | ALDH1A1 (0.44) | ALDH1A1 | |
| SCHEMBL25372183 | 0.82 | CYP1A2 (0.42) | ALDH1A1 | |
| SCHEMBL6557086 | 0.81 | PAX8 (0.34) | ALDH1A1PAX8 | |
| SCHEMBL22031900 | 0.80 | — | — | |
| SCHEMBL25404749 | 0.78 | TSHR (0.32) | — | |
| SCHEMBL25374305 | 0.78 | TSHR (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240351880-A1 | METHOD FOR PREPARING SINGLE-WALLED CARBON NANOTUBES USING SINGEL-ATOM CATALYST, AND SINGLE-WALLED CARBON NANOTUBES PREPARED THEREBY | KOREA INSTITUTE OF ENERGY RESEARCH (KR) | 2024-10-24 | — | — | US | disclosed |
| US-10167304-B2 | Ruthenium compound, material for thin film formation, and process for thin film formation | ADEKA CORPORATION (JP) | 2019-01-01 | — | — | US | disclosed |
| EP-2754638-B1 | FILM-FORMING MATERIAL, GROUP IV METAL OXIDE FILM AND VINYLENE DIAMIDE COMPLEX | TOSOH CORP (JP) | 2018-11-07 | — | — | EP | disclosed |
| EP-3144293-B1 | COPPER COMPOUND, STARTING MATERIAL FOR FORMING THIN FILM AND METHOD FOR PRODUCING THIN FILM | ADEKA CORP (JP) | 2018-09-19 | — | — | EP | disclosed |
| US-9994593-B2 | Copper compound, starting material for forming thin film, and method for manufacturing thin film | ADEKA CORPORATION (JP) | 2018-06-12 | — | — | US | disclosed |
| EP-3144313-A1 | COBALT COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, AND METHOD FOR PRODUCING THIN FILM | Adeka Corporation (JP) | 2017-03-22 | — | — | EP | disclosed |
| EP-3144293-A1 | COPPER COMPOUND, STARTING MATERIAL FOR FORMING THIN FILM AND METHOD FOR PRODUCING THIN FILM | Adeka Corporation (JP) | 2017-03-22 | — | — | EP | disclosed |
| US-20170050998-A1 | COBALT COMPOUND, THIN FILM-FORMING RAW MATERIAL, AND METHOD FOR PRODUCING THIN FILM | ADEKA CORPORATION (JP) | 2017-02-23 | — | — | US | disclosed |
| US-20170044188-A1 | COPPER COMPOUND, STARTING MATERIAL FOR FORMING THIN FILM, AND METHOD FOR MANUFACTURING THIN FILM | ADEKA CORPORATION (JP) | 2017-02-16 | — | — | US | disclosed |
| US-20160272664-A1 | RUTHENIUM COMPOUND, MATERIAL FOR THIN FILM FORMATION, AND PROCESS FOR THIN FILM FORMATION | ADEKA CORPORATION (JP) | 2016-09-22 | — | — | US | disclosed |
| US-9371452-B2 | Film-forming material, group IV metal oxide film and vinylenediamide complex | TOSOH CORPORATION (JP) | 2016-06-21 | — | — | US | disclosed |
| CN-105001254-A | Manufacturing methods for film-forming material, group IV metal oxide film | TOSOH CORP | 2015-10-28 | — | — | CN | disclosed |
| US-20140227456-A1 | FILM-FORMING MATERIAL, GROUP IV METAL OXIDE FILM AND VINYLENEDIAMIDE COMPLEX | SAGAMI CHEMICAL RESEARCH INSTITUTE (JP) | 2014-08-14 | — | — | US | disclosed |
| CN-103917487-A | Film-forming material, group IV metal oxide film, and vinylidene diamide complex | TOSOH CORP | 2014-07-09 | — | — | CN | disclosed |
| US-7501153-B2 | Alkoxide compound, thin film-forming material and method for forming thin film | ADEKA CORPORATION (JP) | 2009-03-10 | — | — | US | disclosed |
| US-20080085365-A1 | Alkoxide Compound, Thin Film-Forming Material And Method For Forming Thin Film | ADEKA CORPORATION (JP) | 2008-04-10 | — | — | US | disclosed |
| EP-1847532-A1 | IGF-1R INHIBITOR | KYOWA HAKKO KOGYO CO., LTD. (JP) | 2007-10-24 | — | — | EP | disclosed |
| WO-2007048802-A1 | (HETERO)ARYL COMPOUNDS WITH MCH ANTAGONISTIC ACTIVITY AND MEDICAMENTS COMPRISING THESE COMPOUNDS | BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) | 2007-05-03 | — | — | WO | disclosed |
| US-6982341-B1 | Volatile copper aminoalkoxide complex and deposition of copper thin film using same | KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) | 2006-01-03 | — | — | US | disclosed |
| EP-0431468-A1 | A poison bait for control for harmful insects | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1991-06-12 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170044188-A1 | COPPER COMPOUND, STARTING MATERIAL FOR FORMING THIN FILM, AND METHOD FOR MANUFACTURING THIN FILM | C5, C9, C1R | ALDH1A1 513/4885PAX8 2361/4885MLYCD 2633/4885 |
| US-20160272664-A1 | RUTHENIUM COMPOUND, MATERIAL FOR THIN FILM FORMATION, AND PROCESS FOR THIN FILM FORMATION | ADH1A, ADH5, ADH1C | ALDH1A1 138/4885PAX8 2590/4885MLYCD 1126/4885 |
| US-10167304-B2 | Ruthenium compound, material for thin film formation, and process for thin film formation | ADH1A, ADH5, ADH1C | ALDH1A1 138/4885PAX8 2590/4885MLYCD 1126/4885 |
| US-20170050998-A1 | COBALT COMPOUND, THIN FILM-FORMING RAW MATERIAL, AND METHOD FOR PRODUCING THIN FILM | C5, C9, TFRC | ALDH1A1 3195/4885PAX8 3253/4885MLYCD 420/4885 |
| US-20080085365-A1 | Alkoxide Compound, Thin Film-Forming Material And Method For Forming Thin Film | APOB, C9, C5 | ALDH1A1 1695/4885PAX8 3262/4885MLYCD 2051/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.