Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PABPC1 | P11940 | 1/20 | 0.37 |
| ▸ | EIF4H | Q15056 | 1/20 | 0.37 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.37 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | HPGD | P15428 | 2/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.34 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.34 |
| ▸ | AR | P10275 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | KCNH2 | Q12809 | 4/20 | 0.32 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3922219 | 0.82 | PTGS2 (0.36) | PABPC1EIF4HCTDSP1PTGS2ALDH1A1 | |
| SCHEMBL7896348 | 0.81 | ALDH1A1 (0.39) | PTGS2ALDH1A1HSD11B1 | |
| Trifluoromethanesulfonic Acid SCHEMBL220567 | 0.77 | HSD11B1 (0.44) | ALDH1A1KCNH2HSD11B1 | |
| SCHEMBL217581 | 0.77 | PABPC1 (0.41) | PABPC1EIF4HCTDSP1ALDH1A1KDM4E | |
| SCHEMBL5441724 | 0.77 | ALDH1A1 (0.36) | PABPC1EIF4HCTDSP1ALDH1A1ESR2 | |
| SCHEMBL7904547 | 0.76 | LIPG (0.42) | KCNH2 | |
| SCHEMBL2634259 | 0.76 | ALDH1A1 (0.39) | PTGS2ALDH1A1KDM4EGAAHSD11B1 | |
| SCHEMBL31290711 | 0.76 | ALDH1A1 (0.39) | PTGS2ALDH1A1KDM4EGAAHSD11B1 | |
| SCHEMBL31695400 | 0.75 | ALDH1A1 (0.50) | ALDH1A1KDM4EGAAPOLBMAPT | |
| SCHEMBL59268 | 0.75 | ALDH1A1 (0.50) | ALDH1A1KDM4EGAAPOLBMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6969577-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2005-11-29 | — | — | US | disclosed |
| US-6803173-B2 | A POLYMER HAVING A SILICON ATOM IN A SIDE CHAIN, WHICH IS INSOLUBLE IN AQUEOUS ALKALI SOLUTION AND BECOMES SOLUBLE IN AQUEOUS ALKALI SOLUTION BY THE ACTION OF AN ACID, GENERATED BY ACID GENERATOR ON EXPOSURE TO ACTIVE LIGHT RADIATION | FUJI PHOTO FILM CO., LTD. (JP) | 2004-10-12 | — | — | US | disclosed |
| EP-1457822-A2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2004-09-15 | — | — | EP | disclosed |
| US-6696219-B2 | MULTILAYER | FUJI PHOTO FILM CO., LTD. (JP) | 2004-02-24 | — | — | US | disclosed |
| US-20030170562-A1 | A polymer having a silicon atom in a side chain, which is insoluble in aqueous alkali solution and becomes soluble in aqueous alkali solution by the action of an acid, generated by acid generator on exposure to active light radiation | FUJI PHOTO FILM CO., LTD. | 2003-09-11 | — | — | US | disclosed |
| US-20020028409-A1 | Positive resist laminate | FUJI PHOTO FILM CO., LTD. | 2002-03-07 | — | — | US | disclosed |