Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | BCHE | P06276 | 5/20 | 0.34 |
| ▸ | ACHE | P22303 | 5/20 | 0.34 |
| ▸ | MEP1B | Q16820 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | RAPGEF4 | Q8WZA2 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 2/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.33 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.32 |
| ▸ | UBE2N | P61088 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 2/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.32 |
| ▸ | GFER | P55789 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4138945 | 0.80 | RAPGEF4 (0.42) | GAAMEP1BRAPGEF4HTTTDP1 | |
| SCHEMBL11680272 | 0.77 | MEP1B (0.38) | GAAMEP1BRAPGEF4HTTTDP1 | |
| Methylamine SCHEMBL28132703 | 0.77 | RAPGEF4 (0.41) | GAAMEP1BRAPGEF4HTTTDP1 | |
| SCHEMBL8079008 | 0.77 | KMT2A (0.40) | GAAMEP1BRAPGEF4HTTTDP1 | |
| SCHEMBL8080270 | 0.75 | GAA (0.40) | GAABCHEACHEKMT2A | |
| SCHEMBL9820124 | 0.74 | CNR2 (0.39) | GAABCHEACHELMNAHTT | |
| SCHEMBL9820115 | 0.74 | TAAR1 (0.36) | GAAMEP1BRAPGEF4HTTTDP1 | |
| SCHEMBL3626865 | 0.73 | POLB (0.44) | GAALMNAL3MBTL1MAPTALDH1A1 | |
| SCHEMBL6544650 | 0.73 | HSD11B1 (0.36) | LMNAHTTL3MBTL1MAPTALDH1A1 | |
| SCHEMBL9820099 | 0.71 | MEN1 (0.45) | BCHEACHELMNATDP1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0743574-B1 | Migration imaging members | XEROX CORP (US) | 2000-12-27 | — | — | EP | claimed |
| EP-0743573-B1 | Method for obtaining image contrast migration imaging members | XEROX CORP (US) | 2000-09-06 | — | — | EP | claimed |
| EP-0743574-A2 | Migration imaging members | XEROX CORPORATION (US) | 1996-11-20 | — | — | EP | claimed |
| EP-0743573-A2 | Method for obtaining image contrast migration imaging members | XEROX CORPORATION (US) | 1996-11-20 | — | — | EP | claimed |
| US-5563014-A | SOFTENABLE LAYER CONTAINIG PHOTOSENSITIVE MARKING MATERIAL; TRANSPARENTIZING AGENT | XEROX CORPORATION (US) | 1996-10-08 | — | — | US | claimed |
| US-5514505-A | SELECTIVE TRANSPARENTIZATION OF PHOTOSENSITIVE MIGRATION MARKING PARTICLES EMBEDDED NEAR THE SURFACE OF A SOFTENABLE LAYER SUPPORTED BY AN ELECTROCONDUCTIVE SUBSTRATE | XEROX CORPORATION (US) | 1996-05-07 | — | — | US | claimed |
| US-20040248042-A1 | using material having both of dry etching resistance and high transparency in exposure light having a short wavelength such as F2 laser beam | DAIKIN INDUSTRIES, LTD. (JP) | 2004-12-09 | — | — | US | disclosed |
| US-20040234899-A1 | Method of forming fine pattern | SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC. (JP) | 2004-11-25 | — | — | US | disclosed |
| EP-1439422-A1 | METHOD OF FORMING FINE PATTERN | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-07-21 | — | — | EP | disclosed |
| US-20040101787-A1 | Fine pattern forming method | DAIKIN INDUSTRIES, LTD. (JP) | 2004-05-27 | — | — | US | disclosed |
| EP-1413927-A1 | METHOD FOR FORMING FINE PATTERN | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-04-28 | — | — | EP | disclosed |
| EP-1376230-A1 | FINE PATTERN FORMING METHOD | Semiconductor Leading Edge Technologies, Inc. (JP) | 2004-01-02 | — | — | EP | disclosed |
| EP-0743574-B1 | Migration imaging members | XEROX CORP (US) | 2000-12-27 | — | — | EP | disclosed |
| EP-0743573-B1 | Method for obtaining image contrast migration imaging members | XEROX CORP (US) | 2000-09-06 | — | — | EP | disclosed |
| US-6054254-A | COATING WITH PHOTORESISTS, EXPOSURE TO LIGHT, DEVELOPMENT | KABUSHIKI KAISHA TOSHIBA (JP) | 2000-04-25 | — | — | US | disclosed |
| EP-0743573-A2 | Method for obtaining image contrast migration imaging members | XEROX CORPORATION (US) | 1996-11-20 | — | — | EP | disclosed |
| EP-0743574-A2 | Migration imaging members | XEROX CORPORATION (US) | 1996-11-20 | — | — | EP | disclosed |
| US-5563014-A | SOFTENABLE LAYER CONTAINIG PHOTOSENSITIVE MARKING MATERIAL; TRANSPARENTIZING AGENT | XEROX CORPORATION (US) | 1996-10-08 | — | — | US | disclosed |
| US-5514505-A | SELECTIVE TRANSPARENTIZATION OF PHOTOSENSITIVE MIGRATION MARKING PARTICLES EMBEDDED NEAR THE SURFACE OF A SOFTENABLE LAYER SUPPORTED BY AN ELECTROCONDUCTIVE SUBSTRATE | XEROX CORPORATION (US) | 1996-05-07 | — | — | US | disclosed |