SCHEMBL663346

SCHEMBL663346

CC(C)Cc1ccc(P(=O)(O)O)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS1 P23219 4/20 0.48
PTGS2 P35354 4/20 0.48
LMNA P02545 2/20 0.48
CYP2C9 P11712 2/20 0.48
AKR1C3 P42330 2/20 0.48
CXCR1 P25024 2/20 0.48
CXCR2 P25025 2/20 0.48
ALB P02768 1/20 0.48
ESR1 P03372 1/20 0.48
ALOX5 P09917 1/20 0.48
RARB P10826 1/20 0.48
ADRB3 P13945 1/20 0.48
NFKB1 P19838 1/20 0.48
HTR2A P28223 1/20 0.48
NR1I3 Q14994 1/20 0.48
SLC22A6 Q4U2R8 1/20 0.48
CXCL8 P10145 1/20 0.48
TSHR P16473 1/20 0.48
AKR1C2 P52895 1/20 0.48
BLM P54132 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24932635 0.86 PTGS1 (0.47) PTGS1PTGS2LMNACYP2C9AKR1C3
SCHEMBL12611228 0.80 ALDH1A1 (0.44) CA2CA4CA5A
SCHEMBL24931502 0.80 ESR1 (0.38) ESR1TSHRCA2CA4CA5A
SCHEMBL22623355 0.79 PGK1 (0.55) PTGS1PTGS2LMNACYP2C9AKR1C3
SCHEMBL17656768 0.77 PTPRC (0.46) PTGS1PTGS2ESR1HTR2ACA2
Hydrogen Peroxide SCHEMBL9581174 0.77 PTGS1 (0.64) PTGS1PTGS2LMNACYP2C9AKR1C3
SCHEMBL1131597 0.76 PTGS1 (0.56) PTGS1PTGS2LMNACYP2C9AKR1C3
SCHEMBL344618 0.76 SMN1; SMN2 (0.52) LMNATSHRCA2CA4CA5A
SCHEMBL5667423 0.75 CA2 (0.52) LMNACYP2C9ESR1TSHRCA2
SCHEMBL13538582 0.75 HDAC6 (0.40) HTR2ATSHRCA2CA4CA5A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112852014-A Asymmetric organic aromatic ligand metal salt nucleating agent and preparation method and application thereof 华东理工大学 2021-05-28 CN claimed
US-20230117680-A1 CYCLOPHILIN D INHIBITORS AND USES THEREOF THE BROAD INSTITUTE, INC. (US) 2023-04-20 US disclosed
US-20230036933-A1 HETEROCYCLIC INHIBITORS OF ENPP1 VOLASTRA THERAPEUTICS, INC. (US) 2023-02-02 US disclosed
CN-112852014-B Asymmetric organic aromatic ligand metal salt nucleating agent and preparation method and application thereof 华东理工大学 2022-03-15 CN disclosed
CN-112852014-A Asymmetric organic aromatic ligand metal salt nucleating agent and preparation method and application thereof 华东理工大学 2021-05-28 CN disclosed
US-9340660-B2 Poly(3-hydroxyalkanoate) resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-05-17 US disclosed
EP-2479181-B1 METHOD FOR PRODUCING PHOSPHONIC ACID METAL SALT AND THERMOPLASTIC RESIN COMPOSITION CONTAINING PHOSPHONIC ACID METAL SALT NISSAN CHEMICAL IND LTD (JP) 2016-04-20 EP disclosed
EP-2431374-B1 METHOD FOR PRODUCING PHOSPHONIC ACID METAL SALT FINE PARTICLES NISSAN CHEMICAL IND LTD (JP) 2016-03-30 EP disclosed
CN-102482303-B Method For Producing Metal Phosphonate And Thermoplastic Resin Composition Containing Metal Phosphonate NISSAN CHEMICAL IND LTD 2015-07-22 CN disclosed
US-9035100-B2 Method for producing phenylphosphonic acid metal salt composition, and crystal nucleating agent therefrom NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-05-19 US disclosed
US-20140235771-A1 POLY(3-HYDROXYALKANOATE) RESIN COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-08-21 US disclosed
US-8445718-B2 Method for producing phosphonic acid metal salt fine particles NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2013-05-21 US disclosed
EP-2479181-A1 METHOD FOR PRODUCING PHOSPHONIC ACID METAL SALT AND THERMOPLASTIC RESIN COMPOSITION CONTAINING PHOSPHONIC ACID METAL SALT Nissan Chemical Industries, Ltd. (JP) 2012-07-25 EP disclosed
CN-102482303-A Method For Producing Metal Phosphonate And Thermoplastic Resin Composition Containing Metal Phosphonate NISSAN CHEMICAL IND LTD 2012-05-30 CN disclosed
EP-2431374-A1 METHOD FOR PRODUCING PHOSPHONIC ACID METAL SALT FINE PARTICLES Nissan Chemical Industries, Ltd. (JP) 2012-03-21 EP disclosed
US-20120046397-A1 METHOD FOR PRODUCING PHOSPHONIC ACID METAL SALT FINE PARTICLES NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-02-23 US disclosed
EP-1736510-B1 POLYLACTIC ACID RESIN COMPOSITION NISSAN CHEMICAL IND LTD (JP) 2011-12-21 EP disclosed
US-20110196077-A1 PRODUCTION PROCESS OF PHOSPHONIC ACID METAL SALT AND THERMOPLASTIC RESIN COMPOSITION CONTAINING PHOSPHONIC ACID METAL SALT NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2011-08-11 US disclosed
US-7531585-B2 Polyactic acid resin composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2009-05-12 US disclosed
EP-1736510-A1 POLYLACTIC ACID RESIN COMPOSITION Nissan Chemical Industries, Ltd. (JP) 2006-12-27 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230036933-A1 HETEROCYCLIC INHIBITORS OF ENPP1 ENPP1, ENPP3, ENPP2 PTGS1 708/4885PTGS2 1264/4885LMNA 3733/4885
US-20110196077-A1 PRODUCTION PROCESS OF PHOSPHONIC ACID METAL SALT AND THERMOPLASTIC RESIN COMPOSITION CONTAINING PHOSPHONIC ACID METAL SALT PPA1, PHOSPHO1, PRPS1 PTGS1 688/4885PTGS2 1111/4885LMNA 4295/4885
US-20120046397-A1 METHOD FOR PRODUCING PHOSPHONIC ACID METAL SALT FINE PARTICLES PHOSPHO1, PLA2G2C, ACP1 PTGS1 2325/4885PTGS2 2765/4885LMNA 2978/4885
US-20230117680-A1 CYCLOPHILIN D INHIBITORS AND USES THEREOF PPID, PPIF, PPIL1 PTGS1 185/4885PTGS2 1039/4885LMNA 4068/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.