SCHEMBL683148

SCHEMBL683148

COC(C)OCCOCc1ccc(Oc2ccccc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
NAAA Q02083 1/20 0.48
TDP1 Q9NUW8 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
PPARG P37231 4/20 0.43
PPARD Q03181 3/20 0.43
PPARA Q07869 3/20 0.43
LTA4H P09960 6/20 0.42
ADRB2 P07550 1/20 0.40
ADRB1 P08588 1/20 0.40
ADRB3 P13945 1/20 0.40
SLC2A1 P11166 1/20 0.39
FFAR1 O14842 1/20 0.38
FFAR4 Q5NUL3 1/20 0.38
NR1H2 P55055 1/20 0.38
BAX Q07812 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14443383 0.88 ADRB2 (0.51) NAAATDP1L3MBTL1PPARGPPARD
SCHEMBL683431 0.83 LTA4H (0.56) PPARGPPARDPPARALTA4HSLC2A1
SCHEMBL13717070 0.78 KDM4E (0.36)
SCHEMBL683157 0.77 RAB9A (0.50) L3MBTL1LTA4H
SCHEMBL8994543 0.76 TSHR (0.64) NAAAPPARGLTA4HFFAR1FFAR4
SCHEMBL19129544 0.75 LTA4H (0.52) PPARGPPARDPPARALTA4HSLC2A1
SCHEMBL775134 0.75 KCNA3 (0.50) LTA4H
SCHEMBL683156 0.74 NPSR1 (0.44) TDP1L3MBTL1PPARGPPARDPPARA
SCHEMBL10944998 0.74 LTA4H (0.50) NAAATDP1L3MBTL1PPARGLTA4H
SCHEMBL7863823 0.73 TSHR (0.54) NAAATDP1L3MBTL1ADRB2ADRB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed