Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KCNA3 | P22001 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 1/20 | 0.46 |
| ▸ | RAB9A | P51151 | 1/20 | 0.46 |
| ▸ | PKM | P14618 | 2/20 | 0.46 |
| ▸ | HTR1B | P28222 | 2/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | HTR1D | P28221 | 1/20 | 0.46 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.45 |
| ▸ | RECQL | P46063 | 1/20 | 0.45 |
| ▸ | LTA4H | P09960 | 2/20 | 0.44 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.44 |
| ▸ | CHRNB2 | P17787 | 2/20 | 0.43 |
| ▸ | CHRNB4 | P30926 | 2/20 | 0.43 |
| ▸ | CHRNA3 | P32297 | 2/20 | 0.43 |
| ▸ | CHRNA7 | P36544 | 2/20 | 0.43 |
| ▸ | CHRNA4 | P43681 | 2/20 | 0.43 |
| ▸ | DRD2 | P14416 | 1/20 | 0.42 |
| ▸ | DRD4 | P21917 | 1/20 | 0.42 |
| ▸ | DRD3 | P35462 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL683431 | 0.93 | LTA4H (0.56) | KCNA3MAPTRAB9ALTA4H | |
| SCHEMBL28366804 | 0.87 | LMNA (0.48) | KCNA3MAPTRAB9APKMHTR1B | |
| SCHEMBL683157 | 0.87 | RAB9A (0.50) | MAPTRAB9ALMNALTA4HCHRNB2 | |
| SCHEMBL19497635 | 0.85 | CYP2C9 (0.44) | MAPTRAB9AALDH1A1DRD2DRD4 | |
| SCHEMBL683156 | 0.83 | NPSR1 (0.44) | MAPTLMNAALDH1A1RECQLLTA4H | |
| SCHEMBL11220223 | 0.83 | KCNA3 (0.48) | KCNA3MAPTRAB9APKMHTR1B | |
| SCHEMBL14094029 | 0.83 | KCNA3 (0.48) | KCNA3MAPTRAB9APKMHTR1B | |
| SCHEMBL6564405 | 0.82 | KCNA3 (0.56) | KCNA3MAPTRAB9APKMHTR1B | |
| SCHEMBL11135363 | 0.81 | ALDH1A1 (0.62) | KCNA3MAPTRAB9APKMHTR1B | |
| SCHEMBL13717070 | 0.80 | KDM4E (0.36) | KCNA3MAPTLMNAALDH1A1CHRNB4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 83 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20230305392-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-11739056-B2 | Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-08-29 | — | — | US | disclosed |
| US-20230266666-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-08-24 | — | — | US | disclosed |
| US-11681224-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-20 | — | — | US | disclosed |
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-02 | — | — | US | disclosed |
| US-20180065924-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-03-08 | — | — | US | disclosed |
| US-20170305848-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-26 | — | — | US | disclosed |
| US-20170305848-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-10-26 | — | — | US | disclosed |
| US-7476488-B2 | Photosensitive composition and method for forming pattern using same | KABUSHIKI KAISHA TOSHIBA (JP) | 2009-01-13 | — | — | US | disclosed |
| US-20080096130-A1 | POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION | 2008-04-24 | — | — | US | disclosed |
| US-20080096130-A1 | POSITIVE RESIST COMPOSITION | FUJIFILM CORPORATION | 2008-04-24 | — | — | US | disclosed |
| US-7338755-B2 | Photosensitive composition and method for forming pattern using same | KABUSHIKI KAISHA TOSHIBA (JP) | 2008-03-04 | — | — | US | disclosed |
| US-20070238050-A1 | PHOTOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-10-11 | — | — | US | disclosed |
| US-20070238050-A1 | PHOTOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-10-11 | — | — | US | disclosed |
| US-20070224550-A1 | PHOTOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-09-27 | — | — | US | disclosed |
| US-20070224549-A1 | PHOTOSENSITIVE COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-09-27 | — | — | US | disclosed |
| US-7241554-B2 | Photosensitive composition and method for forming pattern using same | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-07-10 | — | — | US | disclosed |
| US-7241554-B2 | Photosensitive composition and method for forming pattern using same | KABUSHIKI KAISHA TOSHIBA (JP) | 2007-07-10 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20170305848-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, AND PHOTOSENSITIVE COMPOSITION | ARSA, SPIN1, ASIC1 | KCNA3 336/4885MAPT 4089/4885RAB9A 323/4885 |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SCO2, CBR1, OXGR1 | KCNA3 1116/4885MAPT 4657/4885RAB9A 3601/4885 |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, H1-0, BET1 | KCNA3 2292/4885MAPT 3864/4885RAB9A 1721/4885 |
| US-11739056-B2 | Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern | CHRM1, CHRM2, SCO2 | KCNA3 1425/4885MAPT 4650/4885RAB9A 2494/4885 |
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | HAX1, BRIX1, RXRA | KCNA3 3829/4885MAPT 1336/4885RAB9A 2566/4885 |
| US-20230266666-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-0, H1-4, CHRM1 | KCNA3 300/4885MAPT 4603/4885RAB9A 1633/4885 |
| US-20180065924-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | C1R, RER1, C1S | KCNA3 290/4885MAPT 3407/4885RAB9A 2745/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.