Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 7/20 | 0.56 |
| ▸ | PLA2G2A | P14555 | 1/20 | 0.51 |
| ▸ | PPARA | Q07869 | 3/20 | 0.49 |
| ▸ | PPARG | P37231 | 2/20 | 0.49 |
| ▸ | PPARD | Q03181 | 2/20 | 0.49 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.45 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | RAB9A | P51151 | 1/20 | 0.45 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.45 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL775134 | 0.93 | KCNA3 (0.50) | LTA4HMAPTRAB9AKCNA3 | |
| SCHEMBL14094038 | 0.85 | LTA4H (0.54) | LTA4HPLA2G2APPARAPPARGPPARD | |
| SCHEMBL11692748 | 0.84 | LTA4H (0.61) | LTA4HPLA2G2APPARAPPARGPPARD | |
| SCHEMBL683157 | 0.84 | RAB9A (0.50) | LTA4HMAPTRAB9A | |
| SCHEMBL683156 | 0.84 | NPSR1 (0.44) | LTA4HPPARAPPARGPPARDMAPT | |
| SCHEMBL683148 | 0.83 | NAAA (0.48) | LTA4HPPARAPPARGPPARDSLC2A1 | |
| SCHEMBL19497635 | 0.82 | CYP2C9 (0.44) | MAPTRAB9A | |
| SCHEMBL28366804 | 0.81 | LMNA (0.48) | LTA4HMAPTRAB9AKCNA3 | |
| SCHEMBL11696533 | 0.80 | LTA4H (0.61) | LTA4HPLA2G2APPARAPPARGPPARD | |
| SCHEMBL8671305 | 0.80 | LTA4H (0.75) | LTA4HPLA2G2APPARAHRH3KCNA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| US-9090722-B2 | Chemical amplification resist composition, and mold preparation method and resist film using the same | FUJIFILM CORPORATION (JP) | 2015-07-28 | — | — | US | disclosed |
| US-20120006788-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20120006788-A1 | CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |