SCHEMBL683157

SCHEMBL683157

COC(C)OCCOc1ccc(OCc2ccccc2)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 2/20 0.50
SMN1; SMN2 Q16637 2/20 0.50
LTA4H P09960 2/20 0.50
CHRNB2 P17787 1/20 0.50
CHRNB4 P30926 1/20 0.50
CHRNA3 P32297 1/20 0.50
CHRNA7 P36544 1/20 0.50
CHRNA4 P43681 1/20 0.50
LMNA P02545 1/20 0.50
CYP1A2 P05177 1/20 0.50
PTGS1 P23219 1/20 0.50
SLC6A2 P23975 1/20 0.50
CYP2C19 P33261 1/20 0.50
PTGS2 P35354 1/20 0.50
SLC6A3 Q01959 1/20 0.50
HIF1A Q16665 1/20 0.50
HDAC6 Q9UBN7 1/20 0.50
MEN1 O00255 1/20 0.50
KMT2A Q03164 1/20 0.50
MAOB P27338 5/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL775134 0.87 KCNA3 (0.50) RAB9ALTA4HCHRNB2CHRNB4CHRNA3
SCHEMBL326525 0.85 LMNA (0.55) RAB9ASMN1; SMN2LTA4HCHRNB2CHRNB4
SCHEMBL682087 0.84 HTR1A (0.54) MAPTL3MBTL1
SCHEMBL683431 0.84 LTA4H (0.56) RAB9ALTA4HMAPT
SCHEMBL9808056 0.81 LMNA (0.72) RAB9ASMN1; SMN2LTA4HCHRNB2CHRNB4
SCHEMBL19497635 0.80 CYP2C9 (0.44) RAB9ASMN1; SMN2MAPT
SCHEMBL7595917 0.80 LMNA (0.60) RAB9ASMN1; SMN2LTA4HCHRNB2CHRNB4
SCHEMBL5677947 0.78 LMNA (0.62) RAB9ASMN1; SMN2LTA4HCHRNB2CHRNB4
SCHEMBL683166 0.77 RCE1 (0.47) CYP1A2SLC6A2CYP2C19SLC6A3MEN1
SCHEMBL683148 0.77 NAAA (0.48) LTA4HL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed