SCHEMBL685624

SCHEMBL685624

C=C(c1ccc(O)cc1)C(F)(F)F

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.52
HSD17B10 Q99714 4/20 0.52
HTT P42858 2/20 0.52
GFER P55789 1/20 0.52
GPR55 Q9Y2T6 1/20 0.52
ESR1 P03372 6/20 0.41
ESR2 Q92731 4/20 0.41
LMNA P02545 5/20 0.40
MEN1 O00255 4/20 0.40
KMT2A Q03164 4/20 0.40
CA1 P00915 3/20 0.40
CA2 P00918 3/20 0.40
CYP3A4 P08684 3/20 0.40
ALOX15 P16050 3/20 0.40
HIF1A Q16665 3/20 0.40
HPGD P15428 2/20 0.40
CA12 O43570 2/20 0.40
CA3 P07451 2/20 0.40
TYR P14679 2/20 0.40
CA4 P22748 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19385678 0.80 PLOD2 (0.45) CA1CA2NPC1RAB9APTGS1
SCHEMBL4263908 0.78 MASP2 (0.41) MAPTHSD17B10ESR1ESR2LMNA
SCHEMBL928167 0.78 CES2 (0.54) MEN1KMT2AHPGDALDH1A1KIF11
SCHEMBL15202933 0.78 CA2 (0.45) HTTLMNAMEN1KMT2ACA2
SCHEMBL16650 0.78 CES2 (0.42) MAPTHTTLMNACA1CA2
SCHEMBL20973221 0.78 CES2 (0.42) LMNACA1CA2CYP3A4ALOX15
SCHEMBL32009 0.77 CES1 (0.52) MAPTHSD17B10LMNAMEN1KMT2A
SCHEMBL9414658 0.76 TSHR (0.55) HSD17B10CA1CA2ALOX15HPGD
SCHEMBL786091 0.76 MAPT (0.43) MAPTHSD17B10HTTGFERGPR55
SCHEMBL27056090 0.75 HSD17B10 (0.52) MAPTHSD17B10HTTGFERGPR55

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10377692-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2019-08-13 US disclosed
US-9726976-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-08 US disclosed
US-9726976-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-08 US disclosed
US-9405187-B2 Salt, acid generator and resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-08-02 US disclosed
US-9405187-B2 Salt, acid generator and resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-08-02 US disclosed
US-9346750-B2 Salt and photoresist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-05-24 US disclosed
US-9346750-B2 Salt and photoresist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-05-24 US disclosed
US-9229320-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-01-05 US disclosed
US-9229320-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-01-05 US disclosed
US-9063414-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2015-06-23 US disclosed
US-20110076617-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-31 US disclosed
US-20110076617-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-31 US disclosed
US-20110065047-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065047-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065040-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065040-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065041-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065041-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110059400-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-10 US disclosed
US-20110059400-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110059400-A1 PHOTORESIST COMPOSITION C1R, C1S, CCNT1 MAPT 708/4885HSD17B10 3383/4885HTT 801/4885
US-20110065047-A1 PHOTORESIST COMPOSITION C1R, C1S, RER1 MAPT 1598/4885HSD17B10 1413/4885HTT 520/4885
US-20110065040-A1 PHOTORESIST COMPOSITION C1R, P4HA1, C1S MAPT 1824/4885HSD17B10 855/4885HTT 537/4885
US-10377692-B2 Photoresist composition C1R, C1S, F12 MAPT 588/4885HSD17B10 3442/4885HTT 656/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.