SCHEMBL6856533

SCHEMBL6856533

O=Cc1cc(C=O)cc(C(F)(F)F)c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.41
RPS6KA3 P51812 1/20 0.39
JAK3 P52333 1/20 0.39
KIF11 P52732 1/20 0.38
ALDH1A1 P00352 2/20 0.37
POLB P06746 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
FBP1 P09467 1/20 0.36
CYP1A2 P05177 1/20 0.34
CYP3A4 P08684 1/20 0.34
HPGD P15428 1/20 0.34
ALOX15 P16050 1/20 0.34
TSHR P16473 1/20 0.34
HIF1A Q16665 1/20 0.34
TXNRD1 Q16881 1/20 0.34
TXNRD3 Q86VQ6 1/20 0.34
TXNRD2 Q9NNW7 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
NFE2L2 Q16236 1/20 0.34
GPR35 Q9HC97 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL66819 0.95 CES2 (0.46) CES2RPS6KA3JAK3KIF11ALDH1A1
SCHEMBL18002229 0.91 AHR (0.41) CES2RPS6KA3JAK3KIF11FBP1
SCHEMBL31736860 0.89 CES2 (0.34) CES2RPS6KA3JAK3KIF11ALDH1A1
SCHEMBL30070463 0.86 KIF11 (0.38) CES2RPS6KA3JAK3KIF11ALDH1A1
SCHEMBL478113 0.86 KIF11 (0.38) CES2RPS6KA3JAK3KIF11ALDH1A1
SCHEMBL13616882 0.84 PTGS1 (0.48) CES2RPS6KA3JAK3ALDH1A1POLB
SCHEMBL344606 0.84 NOTUM (0.43) CES2RPS6KA3JAK3KIF11ALDH1A1
SCHEMBL29417754 0.84 NOTUM (0.43) CES2RPS6KA3JAK3KIF11ALDH1A1
SCHEMBL2474610 0.84 NFE2L2 (0.41) CES2RPS6KA3JAK3KIF11NFE2L2
SCHEMBL29769014 0.84 AHR (0.48) CES2RPS6KA3JAK3KIF11ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11542397-B2 Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device TOKYO OHKA KOGYO CO., LTD. (JP) 2023-01-03 US disclosed
US-20210309866-A1 LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LIGHT-EMITTING DISPLAY ELEMENT PANEL, AND LIGHT-EMITTING DISPLAY DEVICE TOKYO OHKA KOGYO CO., LTD. (JP) 2021-10-07 US disclosed
EP-3812805-A1 LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LUMINESCENT DISPLAY ELEMENT PANEL, AND LUMINESCENT DISPLAY DEVICE TOKYO OHKA KOGYO CO., LTD. (JP) 2021-04-28 EP disclosed
CN-112334795-A Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device 东京应化工业株式会社 2021-02-05 CN disclosed
CN-107429059-B Energy-sensitive resin composition 东京应化工业株式会社 2020-10-23 CN disclosed
CN-106575080-B Energy-sensitive resin composition 东京应化工业株式会社 2020-08-11 CN disclosed
US-10696845-B2 Energy-sensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 2020-06-30 US disclosed
US-10570269-B2 Composition containing microparticles TOKYO OHKA KOGYO CO., LTD. (JP) 2020-02-25 US disclosed
EP-3275940-B1 ENERGY-SENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO LTD (JP) 2019-12-18 EP disclosed
CN-105579907-B Radiation-sensitive composition and pattern production method 东京应化工业株式会社 2019-12-17 CN disclosed
US-20180086717-A1 HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT TOKYO OHKA KOGYO CO., LTD. (JP) 2018-03-29 US disclosed
US-9890250-B2 Method for producing polybenzoxazole resin TOKYO OHKA KOGYO CO., LTD. (JP) 2018-02-13 US disclosed
EP-3275940-A1 ENERGY-SENSITIVE RESIN COMPOSITION Tokyo Ohka Kogyo Co., Ltd. (JP) 2018-01-31 EP disclosed
EP-2947112-B1 METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN TOKYO OHKA KOGYO CO LTD (JP) 2017-09-13 EP disclosed
US-20170115563-A1 ENERGY-SENSITIVE RESIN COMPOSITION TOKYO OHKA KOGYO CO., LTD. (JP) 2017-04-27 US disclosed
CN-105579907-A Radiation-sensitive composition and pattern production method TOKYO OHKA KOGYO CO LTD 2016-05-11 CN disclosed
US-20150337084-A1 METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN TOKYO OHKA KOGYO CO., LTD. (JP) 2015-11-26 US disclosed
EP-2947112-A1 METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN TOKYO OHKA KOGYO CO., LTD. (JP) 2015-11-25 EP disclosed
US-6780561-B2 FOR FORMING PROTECTIVE FILM OR AN INSULATING FILM FOR A SEMICONDUCTOR ELEMENT OR A CIRCUIT BOARD SUCH AS A PRINTED BOARD KANSAI PAINT CO., LTD. (JP) 2004-08-24 US disclosed
US-20030143480-A1 For forming protective film or an insulating film for a semiconductor element or a circuit board such as a printed board KANSAI PAINT CO., LTD. (JP) 2003-07-31 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180086717-A1 HYDROGEN BARRIER AGENT, HYDROGEN BARRIER FILM FORMING COMPOSITION, HYDROGEN BARRIER FILM, METHOD FOR PRODUCING HYDROGEN BARRIER FILM, AND ELECTRONIC ELEMENT SLC9A2, SLC9A1, NHERF1 CES2 3673/4885RPS6KA3 4480/4885JAK3 4527/4885
US-10570269-B2 Composition containing microparticles CHMP4B, EXOSC10, EXOSC9 CES2 4055/4885RPS6KA3 2831/4885JAK3 1280/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.