SCHEMBL685667

SCHEMBL685667

C=Cc1ccc(OCOC)c(CCCCCC)c1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.39
KMT2A Q03164 4/20 0.39
ALDH1A1 P00352 2/20 0.39
THRB P10828 2/20 0.39
THRA P10827 1/20 0.39
HTR2A P28223 1/20 0.38
TSHR P16473 2/20 0.38
HTT P42858 4/20 0.38
MAPT P10636 4/20 0.38
MAPK1 P28482 2/20 0.38
APAF1 O14727 2/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
RAD52 P43351 2/20 0.37
NPC1 O15118 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
ALOX5 P09917 6/20 0.37
PTGS2 P35354 4/20 0.37
TRPA1 O75762 1/20 0.35
TDP1 Q9NUW8 2/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL685588 0.99 MAPT (0.38) MEN1KMT2AALDH1A1THRBTHRA
SCHEMBL685877 0.83 TRPA1 (0.40) MEN1KMT2AALDH1A1TSHRMAPT
SCHEMBL685024 0.82 SMPD1 (0.40) ALDH1A1HTTMAPTL3MBTL1SMN1; SMN2
SCHEMBL685022 0.81 FDPS (0.41) ALDH1A1HTTMAPTMAPK1L3MBTL1
SCHEMBL8702775 0.79 MTNR1A (0.50) MEN1KMT2AALDH1A1HTR2ATSHR
SCHEMBL12802075 0.78 TYR (0.46) MEN1KMT2AALDH1A1THRBTHRA
SCHEMBL685597 0.77 LTB4R (0.41) MEN1KMT2AALDH1A1THRBTHRA
SCHEMBL12802596 0.76 TYR (0.43) MEN1KMT2AALDH1A1THRBTHRA
SCHEMBL4260137 0.76 TRPA1 (0.49) MEN1KMT2AALDH1A1TSHRHTT
SCHEMBL685027 0.76 LTB4R (0.40) MEN1KMT2AALDH1A1THRBTHRA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10766992-B2 Resin and resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2020-09-08 US disclosed
US-10377692-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2019-08-13 US disclosed
US-9726976-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-08 US disclosed
US-9726976-B2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-08-08 US disclosed
US-9671693-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-06-06 US disclosed
US-9671693-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-06-06 US disclosed
US-9507258-B2 Resin and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-11-29 US disclosed
US-9507258-B2 Resin and photoresist composition comprising the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-11-29 US disclosed
US-9405187-B2 Salt, acid generator and resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-08-02 US disclosed
US-9405187-B2 Salt, acid generator and resist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-08-02 US disclosed
US-20110065047-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065047-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICHAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065040-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065040-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065041-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110065041-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-17 US disclosed
US-20110059400-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-10 US disclosed
US-20110059400-A1 PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-03-10 US disclosed
US-20100323296-A1 RESIN AND RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-12-23 US disclosed
US-20100323296-A1 RESIN AND RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2010-12-23 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110059400-A1 PHOTORESIST COMPOSITION C1R, C1S, CCNT1 MEN1 1989/4885KMT2A 2110/4885ALDH1A1 2162/4885
US-20110065047-A1 PHOTORESIST COMPOSITION C1R, C1S, RER1 MEN1 1119/4885KMT2A 1331/4885ALDH1A1 1016/4885
US-20110065040-A1 PHOTORESIST COMPOSITION C1R, P4HA1, C1S MEN1 1707/4885KMT2A 807/4885ALDH1A1 706/4885
US-10377692-B2 Photoresist composition C1R, C1S, F12 MEN1 2101/4885KMT2A 2298/4885ALDH1A1 2217/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.