Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Benzil. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.78 |
| ▸ | HPGD | P15428 | 6/20 | 0.78 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.78 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.78 |
| ▸ | NAPRT | Q6XQN6 | 2/20 | 0.78 |
| ▸ | CA12 | O43570 | 1/20 | 0.78 |
| ▸ | CA1 | P00915 | 1/20 | 0.78 |
| ▸ | CA2 | P00918 | 1/20 | 0.78 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.78 |
| ▸ | CA4 | P22748 | 1/20 | 0.78 |
| ▸ | CA6 | P23280 | 1/20 | 0.78 |
| ▸ | CA7 | P43166 | 1/20 | 0.78 |
| ▸ | CA9 | Q16790 | 1/20 | 0.78 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.78 |
| ▸ | CES2 | O00748 | 6/20 | 0.61 |
| ▸ | CES1 | P23141 | 5/20 | 0.61 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.54 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.54 |
| ▸ | MAPT | P10636 | 2/20 | 0.53 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.53 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Salicylic Acid SCHEMBL6948351 | 0.89 | HPGD (0.82) | ALDH1A1HPGDKDM4ESMN1; SMN2NAPRT | |
| SCHEMBL967919 | 0.89 | CES2 (0.64) | ALDH1A1HPGDKDM4ESMN1; SMN2NAPRT | |
| Salicylic Acid SCHEMBL29483467 | 0.89 | HPGD (0.82) | ALDH1A1HPGDKDM4ESMN1; SMN2NAPRT | |
| Salicylic Acid SCHEMBL29360246 | 0.89 | ALDH1A1 (1.00) | ALDH1A1HPGDKDM4ESMN1; SMN2NAPRT | |
| Salicylic Acid SCHEMBL29362663 | 0.89 | ALDH1A1 (1.00) | ALDH1A1HPGDKDM4ESMN1; SMN2NAPRT | |
| Salicylic Acid SCHEMBL29606432 | 0.89 | ALDH1A1 (1.00) | ALDH1A1HPGDKDM4ESMN1; SMN2NAPRT | |
| Salicylic Acid SCHEMBL1509155 | 0.89 | ALDH1A1 (1.00) | ALDH1A1HPGDKDM4ESMN1; SMN2NAPRT | |
| Salicylic Acid SCHEMBL17156443 | 0.89 | ALDH1A1 (1.00) | ALDH1A1HPGDKDM4ESMN1; SMN2NAPRT | |
| Salicylic Acid SCHEMBL1967 | 0.89 | ALDH1A1 (1.00) | ALDH1A1HPGDKDM4ESMN1; SMN2NAPRT | |
| Salicylic Acid SCHEMBL8433746 | 0.89 | ALDH1A1 (1.00) | ALDH1A1HPGDKDM4ESMN1; SMN2NAPRT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2022238599-A1 | POWDERED SHOWER GEL AND PRODUCTION METHOD THEREOF | VÁLQUER LABORATORIOS S.L.U (ES) | 2022-11-17 | — | — | WO | claimed |
| US-8404258-B2 | External preparation for the skin | SHISEIDO COMPANY, LTD. (JP) | 2013-03-26 | — | — | US | claimed |
| WO-2022238599-A1 | POWDERED SHOWER GEL AND PRODUCTION METHOD THEREOF | VÁLQUER LABORATORIOS S.L.U (ES) | 2022-11-17 | — | — | WO | disclosed |
| EP-3809876-A1 | PROTECTIVE AGENT FOR FOOD PRODUCTS AND THE LIKE AND FOR CURING AND/OR STORAGE ROOMS OF THE SAME | PERPRIN S.R.L. (IT) | 2021-04-28 | — | — | EP | disclosed |
| WO-2019243869-A1 | PROTECTIVE AGENT FOR FOOD PRODUCTS AND THE LIKE AND FOR CURING AND/OR STORAGE ROOMS OF THE SAME | PERPRIN S.R.L. (IT) | 2019-12-26 | — | — | WO | disclosed |
| US-8404258-B2 | External preparation for the skin | SHISEIDO COMPANY, LTD. (JP) | 2013-03-26 | — | — | US | disclosed |
| EP-1664928-B1 | POSITIVE PHOTORESIST COMPOSITION AND RESIST PATTERN FORMATION | TOKYO OHKA KOGYO CO LTD (JP) | 2012-02-29 | — | — | EP | disclosed |
| CN-1849559-B | Positive photoresist composition and resist pattern formation method | TOKYO OHKA KOGYO CO LTD | 2010-06-16 | — | — | CN | disclosed |
| US-20090324658-A1 | Cosmetic and Method for Production Thereof | HAKUTO CO., LTD. (JP) | 2009-12-31 | — | — | US | disclosed |
| EP-2065075-A1 | Water-in-oil emulsion composition and cosmetic emulsion comprising the same | Shiseido Company, Ltd. (JP) | 2009-06-03 | — | — | EP | disclosed |
| EP-2047842-A1 | COSMETIC AND METHOD FOR PRODUCTION THEREOF | Hakuto Co., Ltd (JP) | 2009-04-15 | — | — | EP | disclosed |
| US-20050118211-A1 | Water-in-oil emulsion composition and emulsion cosmetic comprising the same | SHISEIDO COMPANY, LTD. (JP) | 2005-06-02 | — | — | US | disclosed |
| WO-2005029184-A2 | POSITIVE PHOTORESIST COMPOSITION AND RESIST PATTERN FORMATION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-03-31 | — | — | WO | disclosed |
| EP-1475070-A1 | WATER-IN-OIL EMULSION COMPOSITION AND EMULSION COSMETIC COMPRISING THE SAME | SHISEIDO COMPANY, LTD. (JP) | 2004-11-10 | — | — | EP | disclosed |
| US-20040197361-A1 | External preparation for the skin | SHISEIDO COMPANY, LTD. (JP) | 2004-10-07 | — | — | US | disclosed |
| EP-1430905-A1 | EXTERNAL PREPARATION FOR THE SKIN | SHISEIDO COMPANY LIMITED (JP) | 2004-06-23 | — | — | EP | disclosed |
| US-6607736-B2 | Endermic liniment comprising diethoxy ethyl succinate and humectant | SHISEIDO COMPANY, LTD. (JP) | 2003-08-19 | — | — | US | disclosed |
| US-20030091603-A1 | Skin preparations for external use | SHISEIDO COMPANY, LTD. (JP) | 2003-05-15 | — | — | US | disclosed |
| EP-1153602-A1 | SKIN PREPARATIONS FOR EXTERNAL USE | SHISEIDO COMPANY LIMITED (JP) | 2001-11-14 | — | — | EP | disclosed |
| US-4845071-A | FOR OVERHEAD PROJECTORS | FUJI PHOTO FILM CO., LTD. (JP) | 1989-07-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030091603-A1 | Skin preparations for external use | CUTA, POLR1C, ACMSD | ALDH1A1 473/4885HPGD 2222/4885KDM4E 592/4885 |
| US-20050118211-A1 | Water-in-oil emulsion composition and emulsion cosmetic comprising the same | CUTA, LIPA, LRBA | ALDH1A1 4585/4885HPGD 3336/4885KDM4E 3284/4885 |
| US-20040197361-A1 | External preparation for the skin | CUTA, DDOST, DSG1 | ALDH1A1 2307/4885HPGD 1106/4885KDM4E 2794/4885 |
| US-20090324658-A1 | Cosmetic and Method for Production Thereof | TYR, MITF, CUTA | ALDH1A1 2794/4885HPGD 3457/4885KDM4E 3628/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.