Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL686743 | 0.82 | ALDH1A1 (0.36) | ALDH1A1LMNAHSD17B10L3MBTL1 | |
| SCHEMBL687031 | 0.79 | ALDH1A1 (0.37) | ALDH1A1LMNAHSD17B10L3MBTL1 | |
| SCHEMBL25812952 | 0.78 | ALDH1A1 (0.36) | ALDH1A1LMNAHSD17B10L3MBTL1 | |
| SCHEMBL16213952 | 0.74 | ALDH1A1 (0.33) | ALDH1A1LMNAHSD17B10L3MBTL1 | |
| SCHEMBL19320562 | 0.72 | ALDH1A1 (0.39) | ALDH1A1LMNAHSD17B10 | |
| SCHEMBL5356743 | 0.72 | ALDH1A1 (0.42) | ALDH1A1LMNAHSD17B10 | |
| SCHEMBL12895538 | 0.71 | ALDH1A1 (0.37) | ALDH1A1LMNAHSD17B10 | |
| SCHEMBL12445294 | 0.71 | ALDH1A1 (0.46) | ALDH1A1LMNAHSD17B10 | |
| SCHEMBL6876173 | 0.71 | ALDH1A1 (0.46) | ALDH1A1LMNAHSD17B10 | |
| SCHEMBL333504 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11796916-B2 | Pattern formation methods and photoresist pattern overcoat compositions | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-10-24 | — | — | US | disclosed |
| US-10684549-B2 | Pattern-formation methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2020-06-16 | — | — | US | disclosed |
| US-20180188654-A1 | PATTERN-FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2018-07-05 | — | — | US | disclosed |
| US-20180188654-A1 | PATTERN-FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2018-07-05 | — | — | US | disclosed |
| US-9996008-B2 | Photoresist pattern trimming methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-06-12 | — | — | US | disclosed |
| US-9996008-B2 | Photoresist pattern trimming methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-06-12 | — | — | US | disclosed |
| US-9869933-B2 | Pattern trimming methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-01-16 | — | — | US | disclosed |
| US-9760011-B1 | Pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-09-12 | — | — | US | disclosed |
| US-9760011-B1 | Pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-09-12 | — | — | US | disclosed |
| US-20170255102-A1 | PATTERN TRIMMING COMPOSITIONS AND METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2017-09-07 | — | — | US | disclosed |
| US-20120052443-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-03-01 | — | — | US | disclosed |
| US-20120034563-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-09 | — | — | US | disclosed |
| US-20120009519-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20110318690-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110200936-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110200935-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-08-18 | — | — | US | disclosed |
| US-20110171576-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20110123926-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-05-26 | — | — | US | disclosed |
| US-20110076617-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20110065040-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-17 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110065040-A1 | PHOTORESIST COMPOSITION | C1R, P4HA1, C1S | ALDH1A1 706/4885LMNA 3442/4885HSD17B10 855/4885 |
| US-20110200935-A1 | PHOTORESIST COMPOSITION | C1R, F12, C1S | ALDH1A1 2022/4885LMNA 2664/4885HSD17B10 2060/4885 |
| US-20120009519-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | C1R, C1S, C9 | ALDH1A1 2064/4885LMNA 2586/4885HSD17B10 1652/4885 |
| US-20110318690-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | RCOR1, C1R, C1S | ALDH1A1 1376/4885LMNA 2974/4885HSD17B10 3256/4885 |
| US-20110171576-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | CLIC1, SLC10A6, APOL1 | ALDH1A1 2416/4885LMNA 558/4885HSD17B10 2371/4885 |
| US-20110200936-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | RER1, AFF1, FRG1 | ALDH1A1 2966/4885LMNA 2778/4885HSD17B10 2146/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.