SCHEMBL69238

SCHEMBL69238

O=C(c1ccc(Br)cc1)C(O)c1ccc(Br)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 4/20 0.58
CES1 P23141 4/20 0.58
LMNA P02545 2/20 0.57
ALDH1A1 P00352 2/20 0.49
KDM4E B2RXH2 1/20 0.49
TSHR P16473 1/20 0.47
HSD17B10 Q99714 1/20 0.47
OGG1 O15527 1/20 0.47
CA1 P00915 2/20 0.46
CA2 P00918 2/20 0.46
CYP1A2 P05177 1/20 0.44
GSK3B P49841 2/20 0.43
KMT2A Q03164 2/20 0.43
MEN1 O00255 1/20 0.43
HDAC3 O15379 1/20 0.41
HDAC4 P56524 1/20 0.41
HDAC1 Q13547 1/20 0.41
HDAC7 Q8WUI4 1/20 0.41
HDAC2 Q92769 1/20 0.41
HDAC10 Q969S8 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14525901 0.94 CES2 (0.53) CES2CES1LMNAALDH1A1KDM4E
SCHEMBL11623528 0.91 CES2 (0.50) CES2CES1LMNAALDH1A1KDM4E
SCHEMBL6203952 0.91 CES2 (0.54) CES2CES1LMNAALDH1A1KDM4E
SCHEMBL11623531 0.91 CES2 (0.50) CES2CES1LMNAALDH1A1KDM4E
SCHEMBL6201840 0.90 LMNA (0.74) CES2CES1LMNAALDH1A1KDM4E
SCHEMBL6202239 0.90 LMNA (0.74) CES2CES1LMNAALDH1A1KDM4E
SCHEMBL4809737 0.86 RAB9A (0.62) CES2CES1LMNAALDH1A1CA1
SCHEMBL29247977 0.86 ALDH1A1 (0.71) CES2CES1LMNAALDH1A1KDM4E
SCHEMBL29134618 0.83 ALDH1A1 (0.59) CES2CES1LMNAALDH1A1KDM4E
Benzoin SCHEMBL6199979 0.83 LMNA (0.64) CES2CES1LMNAALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109665953-A A method of preparing styrax class compound 盐城锦明药业有限公司 2019-04-23 CN disclosed
US-8129087-B2 Block copolymer and substrate processing method CANON KABUSHIKI KAISHA (JP) 2012-03-06 US disclosed
US-7776509-B2 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process CANON KABUSHIKI KAISHA (JP) 2010-08-17 US disclosed
US-20090311637-A1 BLOCK COPOLYMER AND SUBSTRATE PROCESSING METHOD CANON KABUSHIKI KAISHA (JP) 2009-12-17 US disclosed
EP-1956429-A1 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process Canon Kabushiki Kaisha (JP) 2008-08-13 EP disclosed
US-20080187865-A1 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS CANON KABUSHIKI KAISHA (JP) 2008-08-07 US disclosed
US-20070080628-A1 Electroluminescent devices comprising 2-(p-triphenyl)-3-phenyl-pyrazine derivatives CIBA SPECIALTY CHEMICALS CORP. 2007-04-12 US disclosed
US-20070080628-A1 Electroluminescent devices comprising 2-(p-triphenyl)-3-phenyl-pyrazine derivatives CIBA SPECIALTY CHEMICALS CORP. 2007-04-12 US disclosed
US-20070080628-A1 Electroluminescent devices comprising 2-(p-triphenyl)-3-phenyl-pyrazine derivatives CIBA SPECIALTY CHEMICALS CORP. 2007-04-12 US disclosed
EP-1687856-B1 ELECTROLUMINESCENT DEVICES COMPRISING 2-(P-TRIPHENYL)-3-PHENYL-PYRAZINE DERIVATIVES CIBA SC HOLDING AG (CH) 2007-02-28 EP disclosed
EP-0889920-B1 POLYPHENYLENE OLIGOMERS AND POLYMERS DOW CHEMICAL CO (US) 2002-02-13 EP disclosed
EP-1170279-A1 Polyphenylene oligomers and polymers THE DOW CHEMICAL COMPANY (US) 2002-01-09 EP disclosed
US-6288188-B1 ACETYLENIC POLYMERS; INTEGRATED CIRCUITS, DIELECTRICS, MICROELECTRONICS THE DOW CHEMICAL COMPANY 2001-09-11 US disclosed
US-5965679-A BASED A BISCYCLOPENTADIENONE AND AN AROMATIC DIACETYLENE; CURING; LOW DIELECTRIC; INTEGRATED CIRCUITS; MICROELECTRONICS; PRINTED CIRCUITS THE DOW CHEMICAL COMPANY (US) 1999-10-12 US disclosed
EP-0889920-A1 POLYPHENYLENE OLIGOMERS AND POLYMERS THE DOW CHEMICAL COMPANY (US) 1999-01-13 EP disclosed
WO-1998011149-A1 POLYPHENYLENE OLIGOMERS AND POLYMERS THE DOW CHEMICAL COMPANY (US) 1998-03-19 WO disclosed
EP-0010361-B1 BIS-IMIDAZOLES, THEIR PREPARATION AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM SMITHKLINE BECKMAN CORPORATION (US) 1983-04-27 EP disclosed
EP-0010361-A1 Bis-imidazoles, their preparation and pharmaceutical compositions containing them SMITHKLINE BECKMAN CORPORATION (US) 1980-04-30 EP disclosed
US-4188397-A ANTIARTHRITIC, ANTIINFLAMMATORY SMITHKLINE CORPORATION (US) 1980-02-12 US disclosed
US-4013643-A N,N-DISUBSTITUTED 2,3-DIPHENYLALLYLAMINES G. D. SEARLE & CO. (US) 1977-03-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080187865-A1 PHOTOSENSITIVE COMPOUND, PHOTOSENSITIVE COMPOSITION, RESIST PATTERN FORMING METHOD, AND DEVICE PRODUCTION PROCESS FRG1, TYR, RER1 CES2 2709/4885CES1 4346/4885LMNA 2563/4885
US-20070080628-A1 Electroluminescent devices comprising 2-(p-triphenyl)-3-phenyl-pyrazine derivatives C1S, TYR, C5 CES2 1002/4885CES1 3437/4885LMNA 2140/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.