SCHEMBL6929554

SCHEMBL6929554

O=C([O-])C[C@H]1CO1.[Na+]

nearest known ligand 0.00

Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5323037 1.00
SCHEMBL5323032 1.00
SCHEMBL6930369 0.95 CPT2 (0.35)
Potassium Ion SCHEMBL29059618 0.95
Potassium Ion SCHEMBL6928461 0.95
Potassium Ion SCHEMBL21612861 0.78 CHRM2 (0.41)
SCHEMBL28103417 0.75 HPGD (0.45)
SCHEMBL10966085 0.75 ALDH1A1 (0.38)
SCHEMBL3062512 0.72
SCHEMBL169924 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1125059-C Process for manufacturing optically active (S)-3,4-epoxybutyric acid salt SAMSUNG FINE CHEMICALS CO LTD (KR) 2003-10-22 CN disclosed
US-6586616-B1 Cyanation and esterification of 3,4-epoxybutyric acid sodium salts to form chemical intermediates for antilipemic agents; by-product inhibition SAMSUNG FINE CHEMICALS CO., LTD. (KR) 2003-07-01 US disclosed
EP-1149068-A4 A PROCESS FOR PREPARING (R)-4-CYANO-3-HYDROXYBUTYRIC ACID ESTER SAMSUNG FINE CHEMICALS CO LTD (KR) 2003-01-02 EP disclosed
EP-1109797-B1 PROCESS FOR MANUFACTURING AN OPTICALLY ACTIVE (S)-3,4-EPOXYBUTYRIC ACID SALT SAMSUNG FINE CHEMICALS CO LTD (KR) 2002-03-27 EP disclosed
CN-1322199-A Process for manufacturing optically active (S)-3,4-epoxybutyric acid salt SAMSUNG FINE CHEMICALS CO LTD (KR) 2001-11-14 CN disclosed
EP-1149068-A1 A PROCESS FOR PREPARING (R)-4-CYANO-3-HYDROXYBUTYRIC ACID ESTER Samsung Fine Chemicals Co., Ltd. (KR) 2001-10-31 EP disclosed
US-6284902-B1 Process for manufacturing an optically active (S)-3,4-epoxybutyric acid salt SAMSUNG FINE CHEMICALS CO., LTD. (KR) 2001-09-04 US disclosed
EP-1109797-A1 PROCESS FOR MANUFACTURING AN OPTICALLY ACTIVE (S)-3,4-EPOXYBUTYRIC ACID SALT Samsung Fine Chemicals Co., Ltd. (KR) 2001-06-27 EP disclosed
WO-2000046186-A1 A PROCESS FOR PREPARING (R)-4-CYANO-3-HYDROXYBUTYRIC ACID ESTER SAMSUNG FINE CHEMICALS CO., LTD (KR) 2000-08-10 WO disclosed
WO-2000005227-A1 PROCESS FOR MANUFACTURING AN OPTICALLY ACTIVE (S)-3,4-EPOXYBUTYRIC ACID SALT SAMSUNG FINE CHEMICALS CO., LTD. (KR) 2000-02-03 WO disclosed