SCHEMBL6932210

SCHEMBL6932210

Cc1ccccc1S(=O)(=O)C(=[N+]=[N-])C(=O)c1cccc(Cl)c1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PARP1 P09874 1/20 0.38
SMN1; SMN2 Q16637 3/20 0.37
TP53 P04637 1/20 0.37
CNR1 P21554 1/20 0.37
CNR2 P34972 1/20 0.37
ALDH1A1 P00352 4/20 0.37
MAPT P10636 2/20 0.36
ALOX12 P18054 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
SLC6A2 P23975 2/20 0.36
FLT1 P17948 1/20 0.36
FLT4 P35916 1/20 0.36
KDR P35968 1/20 0.36
CHRNA1 P02708 1/20 0.36
CHRNG P07510 1/20 0.36
ITGA5 P08648 1/20 0.36
CHRNB1 P11230 1/20 0.36
CHRNB2 P17787 1/20 0.36
CHRNB4 P30926 1/20 0.36
SLC6A4 P31645 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6932217 0.86 CES2 (0.42) SMN1; SMN2ALDH1A1MAPTFLT1FLT4
SCHEMBL6929196 0.82 PGR (0.44) PARP1ALDH1A1MAPTFLT1FLT4
SCHEMBL6932205 0.81 MAPT (0.50) PARP1SMN1; SMN2ALDH1A1MAPTALOX12
SCHEMBL7962765 0.73 ALDH1A1 (0.37) ALDH1A1ALOX12CYP2C19POLB
SCHEMBL9010834 0.71 KAT6A (0.49) PARP1SMN1; SMN2ALDH1A1MAPTPOLB
SCHEMBL7187013 0.70 IDH1 (0.37) SMN1; SMN2ALDH1A1FLT1FLT4KDR
SCHEMBL29904490 0.69 TSHR (0.44) ALDH1A1CYP2C19NPC1RAB9A
SCHEMBL9010783 0.69 ALDH1A1 (0.47) PARP1SMN1; SMN2TP53ALDH1A1MAPT
SCHEMBL31511320 0.68 CES2 (0.41) SMN1; SMN2TP53ALDH1A1TDP1
SCHEMBL4541609 0.68 RAPGEF4 (0.42) SMN1; SMN2TP53ALDH1A1TDP1CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6589705-B1 Positive-working photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 2003-07-08 US disclosed
US-6555289-B2 Positive photoresist composition comprises a resin having a specific silicon-containing group on the side chain, the solubility of which resin in an akali developer increases under action of an acid FUJI PHOTO FILM CO., LTD. (JP) 2003-04-29 US disclosed
US-6528229-B2 Mixture of polymer and acid generators FUJI PHOTO FILM CO., LTD. (JP) 2003-03-04 US disclosed
US-6506535-B1 A positive working photoresist composition for use in the production of semiconductor integrated circuit devices, mask for the production of integrated circuits, printed wiring boards, liquid crystal panels FUJI PHOTO FILM CO., LTD. (JP) 2003-01-14 US disclosed
US-20020048720-A1 Positive photoresist composition FUJIFILM CORPORATION (JP) 2002-04-25 US disclosed
US-20010041303-A1 Positive photoresist composition FUJIFILM CORPORATION (JP) 2001-11-15 US disclosed
EP-1096319-A1 Positive-working photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 2001-05-02 EP disclosed