SCHEMBL6932217

SCHEMBL6932217

Cc1ccccc1S(=O)(=O)C(=[N+]=[N-])C(=O)c1ccc(Cl)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 3/20 0.42
CES1 P23141 3/20 0.42
ALDH1A1 P00352 4/20 0.40
KMT2A Q03164 3/20 0.40
MEN1 O00255 1/20 0.40
HSD11B1 P28845 2/20 0.38
SMN1; SMN2 Q16637 2/20 0.37
FLT1 P17948 1/20 0.37
FLT4 P35916 1/20 0.37
KDR P35968 1/20 0.37
FNTA P49354 1/20 0.36
PGGT1B P53609 1/20 0.36
IDH1 O75874 2/20 0.35
KDM4E B2RXH2 2/20 0.35
NPC1 O15118 2/20 0.35
HTT P42858 2/20 0.35
RAB9A P51151 2/20 0.35
KDM1A O60341 1/20 0.34
MAOA P21397 1/20 0.34
BCAT1 P54687 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6932210 0.86 PARP1 (0.38) ALDH1A1SMN1; SMN2FLT1FLT4KDR
SCHEMBL7187013 0.82 IDH1 (0.37) CES2CES1ALDH1A1KMT2AMEN1
SCHEMBL8637821 0.80 KMT2A (0.53) CES2CES1ALDH1A1KMT2AMEN1
SCHEMBL6932211 0.78 CES2 (0.56) CES2CES1ALDH1A1KMT2AMEN1
SCHEMBL7962765 0.76 ALDH1A1 (0.37) ALDH1A1KMT2AMEN1HSD11B1HTT
SCHEMBL384366 0.71 CES2 (0.51) CES2CES1ALDH1A1KMT2AMEN1
SCHEMBL4541609 0.71 RAPGEF4 (0.42) ALDH1A1KMT2AMEN1HSD11B1SMN1; SMN2
SCHEMBL25431421 0.70 RAPGEF4 (0.38) ALDH1A1KMT2AMEN1HSD11B1KDM4E
SCHEMBL29904490 0.69 TSHR (0.44) ALDH1A1KMT2ANPC1HTTRAB9A
SCHEMBL1743909 0.69 EPHX2 (0.43) ALDH1A1KMT2AMEN1SMN1; SMN2NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6528229-B2 Mixture of polymer and acid generators FUJI PHOTO FILM CO., LTD. (JP) 2003-03-04 US disclosed
US-20010041303-A1 Positive photoresist composition FUJIFILM CORPORATION (JP) 2001-11-15 US disclosed