Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 3/20 | 0.56 |
| ▸ | CES1 | P23141 | 3/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.51 |
| ▸ | MAPT | P10636 | 2/20 | 0.51 |
| ▸ | HTT | P42858 | 2/20 | 0.51 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.48 |
| ▸ | TP53 | P04637 | 2/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | LMNA | P02545 | 2/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | NOD2 | Q9HC29 | 1/20 | 0.43 |
| ▸ | MAOA | P21397 | 1/20 | 0.42 |
| ▸ | MAOB | P27338 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | ENPP3 | O14638 | 1/20 | 0.41 |
| ▸ | ENPP1 | P22413 | 1/20 | 0.41 |
| ▸ | ENPP2 | Q13822 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 1/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9010795 | 0.93 | CES2 (0.48) | CES2CES1KMT2AMAPTHTT | |
| SCHEMBL9010901 | 0.86 | KMT2A (0.51) | CES2CES1KMT2AMAPTHTT | |
| SCHEMBL384364 | 0.85 | CES2 (0.51) | CES2CES1KMT2AMAPTHTT | |
| SCHEMBL8637821 | 0.85 | KMT2A (0.53) | CES2CES1KMT2AMAPTHTT | |
| SCHEMBL384366 | 0.85 | CES2 (0.51) | CES2CES1KMT2AMAPTHTT | |
| SCHEMBL6932205 | 0.84 | MAPT (0.50) | KMT2AMAPTHTTSMN1; SMN2ALDH1A1 | |
| SCHEMBL9010786 | 0.83 | ALDH1A1 (0.52) | CES2CES1KMT2AMAPTHTT | |
| SCHEMBL9010805 | 0.82 | CYP11B1 (0.43) | CES2CES1KMT2AHTTALDH1A1 | |
| SCHEMBL7697548 | 0.81 | MMP2 (0.39) | CES2CES1KMT2AMAPTHTT | |
| SCHEMBL7722385 | 0.81 | LMNA (0.51) | CES2CES1KMT2AMAPTHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6528229-B2 | Mixture of polymer and acid generators | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-04 | — | — | US | disclosed |
| US-20010041303-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| EP-0417556-B1 | Positive-working radiation-sensitive mixture and recording material prepared therefrom | HOECHST AG (DE) | 1996-12-11 | — | — | EP | disclosed |
| EP-0444493-B1 | Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom | HOECHST AG (DE) | 1996-11-20 | — | — | EP | disclosed |
| US-5424166-A | Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-06-13 | — | — | US | disclosed |
| US-5340682-A | Sensitive, heat resistant, noncorrosive | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-08-23 | — | — | US | disclosed |
| EP-0444493-A2 | Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-09-04 | — | — | EP | disclosed |
| EP-0417556-A2 | Positive-working radiation-sensitive mixture and recording material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-03-20 | — | — | EP | disclosed |