SCHEMBL703559

SCHEMBL703559

CCCO[SiH2]c1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.39
MEN1 O00255 1/20 0.39
KMT2A Q03164 1/20 0.39
ALDH1A1 P00352 3/20 0.36
LTA4H P09960 2/20 0.36
HPGD P15428 1/20 0.36
CHRNB2 P17787 2/20 0.35
CHRNB4 P30926 2/20 0.35
CHRNA3 P32297 2/20 0.35
CHRNA7 P36544 2/20 0.35
CHRNA4 P43681 2/20 0.35
TP53 P04637 1/20 0.33
GAA P10253 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
MAPK1 P28482 1/20 0.32
CYP1A2 P05177 1/20 0.31
CYP2C9 P11712 1/20 0.31
CYP2C19 P33261 1/20 0.31
KCNA3 P22001 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL706853 0.87 LTA4H (0.47) ALDH1A1LTA4HHPGDTP53MAPK1
SCHEMBL689761 0.85 LTA4H (0.47) LMNAMEN1KMT2AALDH1A1LTA4H
SCHEMBL703521 0.81 LTA4H (0.37) MEN1KMT2AALDH1A1LTA4HCHRNB2
SCHEMBL3481941 0.80 ACHE (0.35) MEN1KMT2A
SCHEMBL3298600 0.80 CA2 (0.41) MEN1KMT2AALDH1A1HPGDGAA
Butane SCHEMBL11070114 0.80 LTA4H (0.33) LMNAMEN1KMT2ALTA4HCHRNB2
SCHEMBL3482609 0.78 LPL (0.39) LMNAALDH1A1HPGDTP53SMN1; SMN2
SCHEMBL28428681 0.78 CYP1A2 (0.46) LMNAMEN1KMT2AALDH1A1LTA4H
SCHEMBL28446962 0.78 SMN1; SMN2 (0.39) MEN1KMT2AALDH1A1HPGDTP53
SCHEMBL23701037 0.77 ALDH1A1 (0.32) ALDH1A1MAPK1KCNA3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112126065-B Preparation method of solid silicon carbide ceramic precursor 宁波曙翔新材料股份有限公司 2023-05-02 CN disclosed
CN-106542994-B A kind of synthetic method of allyl acrylate 烟台德邦先进硅材料有限公司 2018-11-09 CN disclosed
CN-106542994-A A kind of synthetic method of allyl acrylate 烟台德邦先进硅材料有限公司 2017-03-29 CN disclosed
EP-2128897-B1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LTD (JP) 2015-05-06 EP disclosed
US-8871890-B2 Curable resin composition and cured article DAICEL CORPORATION (JP) 2014-10-28 US disclosed
US-8791221-B2 Addition-curable metallosiloxane compound DAICEL CORPORATION (JP) 2014-07-29 US disclosed
US-8716209-B2 Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device FUJITSU LIMITED (JP) 2014-05-06 US disclosed
EP-2650319-A1 ADDITION-CURABLE METALLOSILOXANE COMPOUND Daicel Corporation (JP) 2013-10-16 EP disclosed
US-20130267653-A1 ADDITION-CURABLE METALLOSILOXANE COMPOUND DAICEL CORPORATION (JP) 2013-10-10 US disclosed
EP-2636706-A1 CURABLE RESIN COMPOSITION AND CURED ARTICLE Daicel Corporation (JP) 2013-09-11 EP disclosed
US-20130131265-A1 CURABLE RESIN COMPOSITION AND CURED ARTICLE DAICEL CORPORATION (JP) 2013-05-23 US disclosed
US-8299185-B2 Curable cage-type silicone copolymer and process for production thereof and curable resin composition comprising curable cage-type silicone copolymer and cured product thereof NIPPON STEEL CHEMICAL CO., LTD. (JP) 2012-10-30 US disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100280190-A1 CURABLE CAGE-TYPE SILICONE COPOLYMER AND PROCESS FOR PRODUCTION THEREOF AND CURABLE RESIN COMPOSITION COMPRISING CURABLE CAGE-TYPE SILICONE COPOLYMER AND CURED PRODUCT THEREOF NIPPON STEEL CHEMICAL & MATERIAL CO., LTD. (JP) 2010-11-04 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20100007031-A1 AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2010-01-14 US disclosed
EP-2128897-A1 SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE Fujitsu Limited (JP) 2009-12-02 EP disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130267653-A1 ADDITION-CURABLE METALLOSILOXANE COMPOUND B2M, MSI2, MNS1 LMNA 383/4885MEN1 23/4885KMT2A 102/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.