SCHEMBL7183345

SCHEMBL7183345

CC(C)[SiH](O)c1ccccc1

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.34
ADRA2C P18825 2/20 0.34
KDM4E B2RXH2 2/20 0.34
ADRA2A P08913 1/20 0.34
HIF1A Q16665 1/20 0.34
ALDH1A1 P00352 2/20 0.33
TDP1 Q9NUW8 1/20 0.33
TSHR P16473 2/20 0.32
CHRM2 P08172 1/20 0.32
ADRA1A P35348 1/20 0.32
TRPA1 O75762 1/20 0.32
RGS12 O14924 1/20 0.32
GLA P06280 1/20 0.32
CYP3A4 P08684 1/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C9 P11712 1/20 0.32
PKM P14618 1/20 0.32
ALOX15 P16050 1/20 0.32
ALOX12 P18054 1/20 0.32
NFKB1 P19838 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28007303 0.77 TRPA1 (0.37) LMNAADRA2CKDM4EADRA2AHIF1A
SCHEMBL1325645 0.72 TDP1 (0.36) LMNAADRA2CKDM4EADRA2AHIF1A
SCHEMBL380702 0.72 TDP1 (0.36) LMNAADRA2CKDM4EADRA2AHIF1A
SCHEMBL27806636 0.72 ANPEP (0.39) LMNAADRA2CKDM4EADRA2AHIF1A
SCHEMBL8992273 0.70 TDP1 (0.35) LMNAADRA2CKDM4EADRA2AHIF1A
Fluoride SCHEMBL27639901 0.70 TDP1 (0.35) LMNAADRA2CKDM4EADRA2AHIF1A
SCHEMBL571308 0.69
SCHEMBL273487 0.69 ALDH1A1 (0.33) LMNAADRA2CKDM4EADRA2AALDH1A1
SCHEMBL273489 0.69 ACHE (0.39) ALDH1A1TDP1TSHRTRPA1CYP3A4
SCHEMBL705419 0.68 TDP1 (0.33) LMNAADRA2CKDM4EADRA2AHIF1A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113168101-B Photosensitive resin composition, method for producing pattern cured film, interlayer insulating film, coverlay, surface protective film, and electronic component 艾曲迪微系统股份有限公司 2025-02-18 CN disclosed
CN-113168102-B Photosensitive resin composition, method for producing pattern cured product, interlayer insulating film, coverlay, surface protective film, and electronic component 艾曲迪微系统股份有限公司 2024-11-19 CN disclosed
CN-112334833-B Negative photosensitive resin composition, polyimide using same, and method for producing cured relief pattern 旭化成株式会社 2024-09-24 CN disclosed
CN-114502617-B Polyimide precursor, photosensitive resin composition, interlayer insulating film, covercoat, surface protective film, and electronic component 艾曲迪微系统股份有限公司 2024-05-03 CN disclosed
CN-117836927-A Resin cured film, semiconductor device, and method for manufacturing semiconductor device 株式会社力森诺科 2024-04-05 CN disclosed
CN-117730398-A Resin composition for dicing protective layer and method for processing semiconductor wafer 株式会社力森诺科 2024-03-19 CN disclosed
CN-117280447-A Photosensitive resin composition selection method, pattern cured film production method, cured film, semiconductor device, and semiconductor device production method 株式会社力森诺科 2023-12-22 CN disclosed
CN-116710498-A Polyimide precursor resin composition and method for producing same 旭化成株式会社 2023-09-05 CN disclosed
CN-116609998-A Polyimide precursor, negative photosensitive resin composition, and method for producing cured relief pattern using same 旭化成株式会社 2023-08-18 CN disclosed
CN-113820920-B Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2023-07-04 CN disclosed
CN-116194840-A Photosensitive resin composition, permanent resist, method for forming permanent resist, and method for inspecting cured film for permanent resist 株式会社力森诺科 2023-05-30 CN disclosed
CN-104302399-A Process for preparing a catalyst based on a metal of group VIII and comprising silicon, and selective hydrogenation process using said catalyst IFP Energies Nouvelles 2015-01-21 CN disclosed
US-6667410-B2 Reducing an alpha-beta-unsaturated ketone to an alpha-hydroxyketone in presence of a catalyst containing manganes complex and a reducing agent BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM 2003-12-23 US disclosed
US-20020120170-A1 Conversion of alpha,beta-unsaturated ketones and alpha,beta-unsaturated esters into alpha-hydroxy ketones and alpha-hydroxy esters using Mn(III) catalyst, phenylsilane and dioxygen BOARD OF REGENTS THE UNIVERSITY OF TEXAS SYSTEM 2002-08-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20020120170-A1 Conversion of alpha,beta-unsaturated ketones and alpha,beta-unsaturated esters into alpha-hydroxy ketones and alpha-hydroxy esters using Mn(III) catalyst, phenylsilane and dioxygen HSD17B7, CYP17A1, HSD17B1 LMNA 629/4885ADRA2C 736/4885KDM4E 1772/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.