Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 2/20 | 0.44 |
| ▸ | CES2 | O00748 | 1/20 | 0.44 |
| ▸ | CES1 | P23141 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 2/20 | 0.43 |
| ▸ | AHR | P35869 | 1/20 | 0.43 |
| ▸ | MMP13 | P45452 | 2/20 | 0.42 |
| ▸ | MMP2 | P08253 | 1/20 | 0.42 |
| ▸ | MMP8 | P22894 | 1/20 | 0.42 |
| ▸ | MMP12 | P39900 | 1/20 | 0.42 |
| ▸ | MMP14 | P50281 | 1/20 | 0.42 |
| ▸ | MMP16 | P51512 | 1/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | EGFR | P00533 | 1/20 | 0.42 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.42 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.41 |
| ▸ | PKM | P14618 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL107134 | 0.87 | CES1 (0.42) | HSD11B1CES1HTTGAAKMT2A | |
| SCHEMBL15286155 | 0.79 | ALDH1A1 (0.38) | HSD11B1CES1MMP13MMP2GAA | |
| SCHEMBL3285175 | 0.77 | CA2 (0.42) | HTTMMP13MMP2MMP8GAA | |
| SCHEMBL4967080 | 0.77 | HSD11B1 (0.39) | HSD11B1CES1HTTGAAKMT2A | |
| SCHEMBL36493 | 0.75 | PKM (0.47) | HSD11B1HTTAHRMMP13MMP2 | |
| SCHEMBL3143634 | 0.75 | PKM (0.47) | HSD11B1HTTAHRMMP13MMP2 | |
| SCHEMBL2510738 | 0.75 | HSD11B1 (0.43) | HSD11B1CES2CES1HTTAHR | |
| SCHEMBL14675464 | 0.74 | HSD11B1 (0.40) | HSD11B1GAAKMT2ANPSR1KEAP1 | |
| SCHEMBL14674381 | 0.74 | HSD11B1 (0.40) | HSD11B1CES1HTTGAAKMT2A | |
| SCHEMBL6656491 | 0.74 | HSD11B1 (0.40) | HSD11B1CES1HTTGAAKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 206 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12570872-B2 | Acrylic polymerized polysiloxane, composition comprising the same, and cured film produced using the same | MERCK PATENT GMBH (DE) | 2026-03-10 | — | — | US | disclosed |
| US-20250231491-A1 | PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST | SUNTIFIC MATERIALS (WEIFANG)., LTD. (CN) | 2025-07-17 | — | — | US | disclosed |
| US-20250231492-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | SUNTIFIC MATERIALS (WEIFANG)., LTD. (CN) | 2025-07-17 | — | — | US | disclosed |
| US-20250123567-A1 | POLYSILOXANE COMPOSITION | MERCK ELECTRONICS KGAA (DE) | 2025-04-17 | — | — | US | disclosed |
| CN-119816784-A | Fabrication of integrated circuits using positive photo-patternable dielectrics comprising high silicon content polysilsesquioxanes | 潍坊星泰克微电子材料有限公司 | 2025-04-11 | — | — | CN | disclosed |
| CN-119631021-A | Photolithography method using silicon photoresist | 潍坊星泰克微电子材料有限公司 | 2025-03-14 | — | — | CN | disclosed |
| EP-4508495-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | Suntific Materials (Weifang), Ltd. (CN) | 2025-02-19 | — | — | EP | disclosed |
| EP-4508493-A1 | PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST | Suntific Materials (Weifang), Ltd. (CN) | 2025-02-19 | — | — | EP | disclosed |
| WO-2025000537-A1 | PHOTOLITHOGRAPHIC METHOD USING SILICON PHOTORESIST | SUNTIFIC MATERIALS (WEIFANG), LTD. (CN) | 2025-01-02 | — | — | WO | disclosed |
| WO-2025000535-A1 | MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE | SUNTIFIC MATERIALS (WEIFANG), LTD. (CN) | 2025-01-02 | — | — | WO | disclosed |
| EP-1323742-A2 | Radiation sensitive refractive index changing composition and refractive index changing method | JSR Corporation (JP) | 2003-07-02 | — | — | EP | disclosed |
| US-20030068574-A1 | Radiation sensitive resin composition, rib, rib forming method and display element | JSR CORPORATION (JP) | 2003-04-10 | — | — | US | disclosed |
| US-20030064303-A1 | Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern | JSR CORPORATION (JP) | 2003-04-03 | — | — | US | disclosed |
| EP-1296186-A1 | Radiation sensitive resin composition, rib, rib forming method and display element | JSR Corporation (JP) | 2003-03-26 | — | — | EP | disclosed |
| EP-1235104-A1 | COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN | JSR Corporation (JP) | 2002-08-28 | — | — | EP | disclosed |
| US-20020055059-A1 | Radiation sensitive resin composition, cathode separator and el display device | JSR CORPORATION (JP) | 2002-05-09 | — | — | US | disclosed |
| EP-1193557-A1 | Use of a radiation sensitive resin composition for the formation of cathode separator, cathode separator and electroluminescent display device | JSR Corporation (JP) | 2002-04-03 | — | — | EP | disclosed |
| EP-0594452-B1 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-01-15 | — | — | EP | disclosed |
| US-5432039-A | Radiation sensitive quinone diazide and resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-07-11 | — | — | US | disclosed |
| EP-0594452-A2 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-04-27 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12570872-B2 | Acrylic polymerized polysiloxane, composition comprising the same, and cured film produced using the same | SMC1A, SMC2, SMC3 | HSD11B1 2361/4885CES2 1677/4885CES1 2840/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.