Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL98491 | 0.77 | CYP19A1 (0.40) | ADORA3 | |
| SCHEMBL47470 | 0.77 | CYP19A1 (0.40) | ADORA3 | |
| SCHEMBL47410 | 0.77 | CYP19A1 (0.40) | ADORA3 | |
| SCHEMBL47429 | 0.77 | CYP19A1 (0.40) | ADORA3 | |
| SCHEMBL98333 | 0.77 | CYP19A1 (0.40) | ADORA3 | |
| SCHEMBL17471359 | 0.77 | ALDH1A1 (0.34) | — | |
| SCHEMBL47406 | 0.76 | ADORA3 (0.33) | ADORA3 | |
| SCHEMBL18068643 | 0.76 | ADORA3 (0.33) | ADORA3 | |
| SCHEMBL12378936 | 0.76 | ADORA3 (0.33) | ADORA3 | |
| SCHEMBL98341 | 0.76 | ADORA3 (0.33) | ADORA3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230242467-A1 | HIGH PURITY 4-HYDROXYSTYRENE SOLUTION, METHOD OF PRODUCING THE SAME, AND METHOD OF PRODUCING 4-HYDROXYSTYRENE POLYMER | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2023-08-03 | — | — | US | disclosed |
| US-9546133-B2 | Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2017-01-17 | — | — | US | disclosed |
| US-20160023992-A1 | METHOD FOR PRODUCING COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY CONTAINING REDUCED AMOUNT OF METAL IMPURITIES, AND METHOD FOR PURIFYING POLYMERIZATION INITIATOR FOR PRODUCTION OF COPOLYMER | MARUZEN PETROCHEMICAL CO., LTD. | 2016-01-28 | — | — | US | disclosed |
| US-9216948-B2 | Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2015-12-22 | — | — | US | disclosed |
| US-8859180-B2 | Copolymer and composition for semiconductor lithography and process for producing the copolymer | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8859180-B2 | Copolymer and composition for semiconductor lithography and process for producing the copolymer | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8759462-B2 | Method for producing resist copolymer having low molecular weight | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2014-06-24 | — | — | US | disclosed |
| US-20130123446-A1 | METHOD FOR PRODUCING RESIST COPOLYMER HAVING LOW MOLECULAR WEIGHT | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2013-05-16 | — | — | US | disclosed |
| US-8377625-B2 | Method for producing a copolymer solution with a uniform concentration for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2013-02-19 | — | — | US | disclosed |
| US-20120271020-A1 | METHOD FOR PRODUCING COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY CONTAINING REDUCED AMOUNT OF METAL IMPURITIES, AND METHOD FOR PURIFYING POLYMERIZATION INITIATOR FOR PRODUCTION OF COPOLYMER | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2012-10-25 | — | — | US | disclosed |
| US-8211615-B2 | Copolymer for immersion lithography and compositions | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2012-07-03 | — | — | US | disclosed |
| US-20120071638-A1 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2012-03-22 | — | — | US | disclosed |
| US-8067516-B2 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2011-11-29 | — | — | US | disclosed |
| US-7960494-B2 | Copolymer for semiconductor lithography and process for producing the same | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2011-06-14 | — | — | US | disclosed |
| US-20100143842-A1 | METHOD FOR PRODUCING A COPOLYMER SOLUTION WITH A UNIFORM CONCENTRATION FOR SEMICONDUCTOR LITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-06-10 | — | — | US | disclosed |
| US-20100062371-A1 | Copolymer and composition for semiconductor lithography and process for producing the copolymer | MARUZEN PETROCHEMICAL CO., LTD (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100047710-A1 | COPOLYMER FOR IMMERSION LITHOGRAPHY AND COMPOSITIONS | MARUZEN PETROCHEMICAL CO., LTD (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20090306328-A1 | COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY AND PROCESS FOR PRODUCING THE SAME | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2009-12-10 | — | — | US | disclosed |
| US-20070269741-A1 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2007-11-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120271020-A1 | METHOD FOR PRODUCING COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY CONTAINING REDUCED AMOUNT OF METAL IMPURITIES, AND METHOD FOR PURIFYING POLYMERIZATION INITIATOR FOR PRODUCTION OF COPOLYMER | ORAI1, STOM, SORT1 | ADORA3 4829/4885 |
| US-20120071638-A1 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | FRG1, H1-10, POLL | ADORA3 3976/4885 |
| US-20160023992-A1 | METHOD FOR PRODUCING COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY CONTAINING REDUCED AMOUNT OF METAL IMPURITIES, AND METHOD FOR PURIFYING POLYMERIZATION INITIATOR FOR PRODUCTION OF COPOLYMER | ORAI1, STOM, SORT1 | ADORA3 4829/4885 |
| US-20230242467-A1 | HIGH PURITY 4-HYDROXYSTYRENE SOLUTION, METHOD OF PRODUCING THE SAME, AND METHOD OF PRODUCING 4-HYDROXYSTYRENE POLYMER | HAAO, HPD, IL4 | ADORA3 2847/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.