Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP4F2 | P78329 | 2/20 | 0.36 |
| ▸ | CYP4A11 | Q02928 | 2/20 | 0.36 |
| ▸ | MMP8 | P22894 | 2/20 | 0.34 |
| ▸ | PKM | P14618 | 2/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
| ▸ | POLB | P06746 | 1/20 | 0.30 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10062499 | 0.88 | HTT (0.37) | — | |
| SCHEMBL14649797 | 0.88 | GRM1 (0.30) | — | |
| SCHEMBL14770509 | 0.88 | — | — | |
| SCHEMBL10096781 | 0.86 | MMP8 (0.38) | CYP4F2CYP4A11MMP8 | |
| SCHEMBL12725819 | 0.86 | — | — | |
| SCHEMBL799831 | 0.85 | CTRB1 (0.33) | — | |
| SCHEMBL10170918 | 0.85 | ALDH1A1 (0.36) | — | |
| SCHEMBL10170972 | 0.85 | — | — | |
| SCHEMBL15396640 | 0.85 | — | — | |
| SCHEMBL16905091 | 0.84 | PTPN1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9720322-B2 | Photoresist composition, compound, and production method thereof | JSR CORPORATION (JP) | 2017-08-01 | — | — | US | disclosed |
| US-9529259-B2 | Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, compound, and method for producing compound | JSR CORPORATION (JP) | 2016-12-27 | — | — | US | disclosed |
| US-20160370700-A1 | PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF | JSR CORPORATION (JP) | 2016-12-22 | — | — | US | disclosed |
| US-9488914-B2 | Fluorine-containing sulfonic acid salt, fluorine-containing sulfonic acid salt resin, resist composition, and pattern forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2016-11-08 | — | — | US | disclosed |
| US-9477149-B2 | Photoresist composition, compound, and production method thereof | JSR CORPORATION (JP) | 2016-10-25 | — | — | US | disclosed |
| US-20150355539-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, COMPOUND, AND METHOD FOR PRODUCING COMPOUND | JSR CORPORATION (JP) | 2015-12-10 | — | — | US | disclosed |
| US-20150198879-A1 | Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-07-16 | — | — | US | disclosed |
| US-20150004545-A1 | PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF | JSR CORPORATION (JP) | 2015-01-01 | — | — | US | disclosed |
| US-8252509-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-08-28 | — | — | US | disclosed |
| US-8188299-B2 | Acrylate derivatives, alcohol derivatives, and method for producing them | KURARAY CO., LTD. (JP) | 2012-05-29 | — | — | US | disclosed |
| US-20120082935-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FORMED USING THE SAME | JSR CORPORATION (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20120071667-A1 | ACRYLATE DERIVATIVES, ALCOHOL DERIVATIVES, AND METHOD FOR PRODUCING THEM | KURARAY CO., LTD. (JP) | 2012-03-22 | — | — | US | disclosed |
| US-20110117491-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-05-19 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160370700-A1 | PHOTORESIST COMPOSITION, COMPOUND, AND PRODUCTION METHOD THEREOF | RARA, H1-0, NR2E3 | CYP4F2 2848/4885CYP4A11 2052/4885MMP8 3897/4885 |
| US-20150198879-A1 | Fluorine-Containing Sulfonic Acid Salt, Fluorine-Containing Sulfonic Acid Salt Resin, Resist Composition, and Pattern Forming Method Using Same | RER1, SMARCC1, SMCHD1 | CYP4F2 3905/4885CYP4A11 4719/4885MMP8 4279/4885 |
| US-20120071667-A1 | ACRYLATE DERIVATIVES, ALCOHOL DERIVATIVES, AND METHOD FOR PRODUCING THEM | ADH1A, ADH1C, ADH5 | CYP4F2 2112/4885CYP4A11 336/4885MMP8 4102/4885 |
| US-20150355539-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, COMPOUND, AND METHOD FOR PRODUCING COMPOUND | RER1, MSR1, MRPS35 | CYP4F2 3513/4885CYP4A11 4725/4885MMP8 3178/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.