SCHEMBL8046887

SCHEMBL8046887

O=C(O)c1ccc(-c2ccc(S(=O)(=O)c3ccc(Cl)cc3)cc2S(=O)(=O)c2ccc(Cl)cc2)cc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.51
MAPK1 P28482 2/20 0.51
KDM4E B2RXH2 1/20 0.51
MEN1 O00255 1/20 0.51
MAPT P10636 1/20 0.51
KMT2A Q03164 1/20 0.51
SRD5A2 P31213 2/20 0.50
CHEK2 O96017 1/20 0.50
ALOX15 P16050 1/20 0.47
TSHR P16473 1/20 0.47
LMNA P02545 1/20 0.46
MAP4K4 O95819 1/20 0.45
CYP3A4 P08684 1/20 0.44
RXRA P19793 1/20 0.44
RXRB P28702 1/20 0.44
POLB P06746 4/20 0.44
APEX1 P27695 1/20 0.44
CTDSP1 Q9GZU7 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
HPGD P15428 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8064310 0.86 POLB (0.57) ALDH1A1MEN1MAPTKMT2AMAP4K4
SCHEMBL8046836 0.82 ALDH1A1 (0.48) ALDH1A1KMT2ARXRARXRBPOLB
SCHEMBL6902193 0.82 ALOX15 (0.71) ALDH1A1MAPK1KDM4EMEN1MAPT
SCHEMBL8046884 0.77 SLC16A1 (0.46) ALDH1A1MAPK1KDM4EMEN1MAPT
SCHEMBL8064351 0.76 HSD17B13 (0.46) ALDH1A1MEN1MAPTKMT2AMAP4K4
SCHEMBL9840644 0.76 KIF18A (0.51) ALDH1A1MAPK1KDM4EMEN1MAPT
SCHEMBL9452111 0.76 PGR (0.49) ALDH1A1MAPK1CYP3A4L3MBTL1
SCHEMBL5634042 0.75 APEX1 (0.52) ALDH1A1MAPK1KDM4EMEN1MAPT
SCHEMBL9852574 0.75 CA12 (0.70) ALDH1A1KDM4EMEN1KMT2ATSHR
SCHEMBL28246658 0.74 POLB (0.53) ALDH1A1MAPTPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6040470-A DERIVATIVES OF 1-ORGANOETHER,-ESTER OR SULFONE-2,4-BIS-PHENYLSULFONYL)BENZENE IN AN AQUEOUS DEVELOPER SLURRY TO PREVENT DETERIORATION OF DISPERSION DUE TO HYDRATION; HIGHLY SENSITIVE; LESS SURFACE BLUSHING; STORAGE STABILITY OF IMAGE SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 2000-03-21 US disclosed
EP-0791578-B1 Sulfonyl compound and thermalsensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1999-11-10 EP disclosed
US-5840652-A HIGH SENSITIVITY, STORAGE STABILITY SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 1998-11-24 US disclosed
EP-0791578-A2 Sulfonyl compound and thermalsensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1997-08-27 EP disclosed