SCHEMBL8046884

SCHEMBL8046884

O=C(O)c1ccccc1-c1ccc(S(=O)(=O)c2ccc(Cl)cc2)cc1S(=O)(=O)c1ccc(Cl)cc1

nearest known ligand 0.46

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
SLC16A1 P53985 1/20 0.46
ALDH1A1 P00352 3/20 0.43
MAPK1 P28482 2/20 0.43
CYP3A4 P08684 1/20 0.43
HSP90AA1 P07900 1/20 0.43
POLB P06746 2/20 0.43
HPGD P15428 1/20 0.43
MAPT P10636 2/20 0.42
KDM4E B2RXH2 1/20 0.41
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
PTGER1 P34995 1/20 0.41
CCR2 P41597 2/20 0.41
NR4A1 P22736 1/20 0.41
KIF18A Q8NI77 1/20 0.41
CCR1 P32246 1/20 0.41
FOLH1 Q04609 1/20 0.40
BCL2L1 Q07817 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8064306 0.86 ALDH1A1 (0.45) SLC16A1ALDH1A1POLBHPGDMAPT
SCHEMBL8046829 0.83 ALDH1A1 (0.45) ALDH1A1POLBHPGDMAPTMEN1
SCHEMBL8058706 0.82 ALDH1A1 (0.47) ALDH1A1MAPK1CYP3A4POLBHPGD
SCHEMBL5134479 0.79 MMP2 (0.53) ALDH1A1MAPK1CYP3A4POLBMAPT
SCHEMBL8064348 0.77 POLB (0.43) ALDH1A1POLBHPGDMAPTKDM4E
SCHEMBL8046887 0.77 ALDH1A1 (0.51) ALDH1A1MAPK1CYP3A4POLBHPGD
SCHEMBL10670726 0.75 KIF18A (0.55) SLC16A1ALDH1A1MAPK1MAPTKDM4E
SCHEMBL7820979 0.75 POLB (0.60) SLC16A1ALDH1A1MAPK1CYP3A4POLB
SCHEMBL8061969 0.75 HTR6 (0.50) SLC16A1ALDH1A1POLBHPGDMAPT
SCHEMBL227808 0.74 KIF18A (0.57) ALDH1A1MAPK1CYP3A4HSP90AA1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6040470-A DERIVATIVES OF 1-ORGANOETHER,-ESTER OR SULFONE-2,4-BIS-PHENYLSULFONYL)BENZENE IN AN AQUEOUS DEVELOPER SLURRY TO PREVENT DETERIORATION OF DISPERSION DUE TO HYDRATION; HIGHLY SENSITIVE; LESS SURFACE BLUSHING; STORAGE STABILITY OF IMAGE SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 2000-03-21 US disclosed
EP-0791578-B1 Sulfonyl compound and thermalsensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1999-11-10 EP disclosed
US-5840652-A HIGH SENSITIVITY, STORAGE STABILITY SANKO KAIHATSU KAGAKU KENKYUSHO (JP) 1998-11-24 US disclosed
EP-0791578-A2 Sulfonyl compound and thermalsensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1997-08-27 EP disclosed