SCHEMBL8680650

SCHEMBL8680650

Cc1cc(C(=O)c2ccccc2)c(O)c(O)c1O

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BCL2 P10415 3/20 0.68
MCL1 Q07820 3/20 0.68
KDM4E B2RXH2 2/20 0.51
MAPT P10636 2/20 0.51
MAPK1 P28482 2/20 0.51
HSD17B10 Q99714 2/20 0.51
ALOX15 P16050 1/20 0.51
GABRA1 P14867 1/20 0.50
GABRB1 P18505 1/20 0.50
MEN1 O00255 1/20 0.49
USP2 O75604 1/20 0.49
GAA P10253 1/20 0.49
KMT2A Q03164 1/20 0.49
KEAP1 Q14145 1/20 0.49
NFE2L2 Q16236 1/20 0.49
AKR1C3 P42330 2/20 0.47
ALDH1A1 P00352 4/20 0.46
BCL2L1 Q07817 1/20 0.46
LMNA P02545 2/20 0.46
HPGD P15428 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6842046 0.90 BCL2 (0.54) BCL2MCL1KDM4EMAPTMAPK1
SCHEMBL2865160 0.87 BCL2 (0.53) BCL2MCL1KDM4EMAPTMAPK1
SCHEMBL27639385 0.87 BCL2 (0.53) BCL2MCL1KDM4EMAPTMAPK1
SCHEMBL15313729 0.86 BCL2 (0.68) BCL2MCL1KDM4EMAPTMAPK1
SCHEMBL6842050 0.85 ALDH1A1 (0.56) BCL2MCL1KDM4EMAPTMAPK1
SCHEMBL2861855 0.84 LMNA (0.53) BCL2MCL1KDM4EMAPTMAPK1
SCHEMBL5712263 0.84 GABRA1 (0.53) BCL2MCL1KDM4EMAPTMAPK1
SCHEMBL28687922 0.83 KDM4E (0.62) BCL2MCL1KDM4EMAPTMAPK1
SCHEMBL4400929 0.82 AKR1C3 (0.57) KDM4EMAPTMEN1USP2GAA
SCHEMBL5712155 0.81 BCL2 (0.57) BCL2MCL1KDM4EMAPTMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5853949-A Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound FUJI PHOTO FILM CO., LTD. (JP) 1998-12-29 US disclosed
US-5225310-A Positive working light sensitive element HOECHST AKTIENGESELLSCHAFT (DE) 1993-07-06 US disclosed
EP-0295465-A1 Light sensitive composition with 1,2-naphthoquinonediazide, light sensitive registration material prepared therefrom and use thereof HOECHST AKTIENGESELLSCHAFT (DE) 1988-12-21 EP disclosed