SCHEMBL8740886

SCHEMBL8740886

C1CCC(OC2CCCCO2)OC1.O=S(=O)(c1ccc(O)cc1)c1ccc(O)cc1

nearest known ligand 0.42

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.42
PKM P14618 2/20 0.42
CA2 P00918 9/20 0.41
CA1 P00915 7/20 0.41
CA12 O43570 6/20 0.41
CA9 Q16790 6/20 0.41
ELANE P08246 1/20 0.41
ESR1 P03372 1/20 0.37
ALDH1A1 P00352 2/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
LMNA P02545 2/20 0.36
PTPN1 P18031 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydroquinone SCHEMBL9403963 0.87 ALDH1A1 (0.40) CA2CA1CA12CA9ALDH1A1
SCHEMBL7736947 0.80 ALOX15 (0.43) CA2CA1CA12CA9ESR1
SCHEMBL2118630 0.80 CA12 (0.36) CA2CA1CA12CA9ALDH1A1
SCHEMBL8740885 0.78 PKM (0.44) GAAPKMELANEALDH1A1MEN1
SCHEMBL822686 0.77 MEN1 (0.39) GAAPKMCA2CA1CA12
Bisphenol A SCHEMBL8740866 0.77 ESR1 (0.50) CA2CA1CA12CA9ESR1
SCHEMBL5765450 0.77 ENPP2 (0.47) CA2CA1CA12CA9ALDH1A1
SCHEMBL15093765 0.72 MEN1 (0.43) CA2CA1CA12CA9ESR1
SCHEMBL222919 0.72 MEN1 (0.43) CA2CA1CA12CA9ESR1
SCHEMBL15093959 0.72 MEN1 (0.43) CA2CA1CA12CA9ESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5700620-A POSITIVE PHOTORESIST HAVING HIGH RESOLUTION AND SMALL FILM THICKNESS DEPENDENCE FUJI PHOTO FILM CO., LTD. (JP) 1997-12-23 US disclosed
US-5609982-A Positive-working photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1997-03-11 US disclosed
EP-0658807-A1 Positive-working photoresist composition FUJI PHOTO FILM CO., LTD. (JP) 1995-06-21 EP disclosed