SCHEMBL9010756

SCHEMBL9010756

COc1cccc(C(=O)C(=[N+]=[N-])S(=O)(=O)c2ccccc2)c1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.57
CES2 O00748 1/20 0.55
CES1 P23141 1/20 0.55
KAT6A Q92794 3/20 0.52
RAB9A P51151 5/20 0.48
NPC1 O15118 4/20 0.48
MAOB P27338 1/20 0.47
SMN1; SMN2 Q16637 2/20 0.46
PARP1 P09874 1/20 0.46
STS P08842 2/20 0.45
KCNK3 O14649 1/20 0.44
KCNK9 Q9NPC2 1/20 0.44
BCHE P06276 1/20 0.44
KMT2A Q03164 3/20 0.44
MEN1 O00255 2/20 0.44
ABCG2 Q9UNQ0 1/20 0.43
NLRP3 Q96P20 1/20 0.43
ALDH1A1 P00352 2/20 0.43
MAPT P10636 1/20 0.42
PKM P14618 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9010847 0.90 CES2 (0.52) HSD11B1CES2CES1KAT6ARAB9A
SCHEMBL9010827 0.85 ALDH1A1 (0.57) HSD11B1CES2CES1RAB9ANPC1
SCHEMBL6932659 0.83 HSD11B1 (0.54) HSD11B1CES2CES1KAT6ARAB9A
SCHEMBL9010834 0.83 KAT6A (0.49) HSD11B1KAT6ASMN1; SMN2PARP1KCNK3
SCHEMBL546386 0.82 CES2 (0.45) HSD11B1CES2CES1KAT6ARAB9A
SCHEMBL9010819 0.80 BRD4 (0.44) HSD11B1KAT6ARAB9ANPC1SMN1; SMN2
SCHEMBL6929196 0.80 PGR (0.44) HSD11B1KAT6ARAB9ANPC1MAOB
SCHEMBL9010800 0.79 CES2 (0.53) CES2CES1KAT6ASMN1; SMN2KMT2A
SCHEMBL3177012 0.77 PGR (0.47) HSD11B1KAT6A
SCHEMBL30457795 0.77 PGR (0.47) HSD11B1KAT6A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0417556-B1 Positive-working radiation-sensitive mixture and recording material prepared therefrom HOECHST AG (DE) 1996-12-11 EP disclosed
EP-0444493-B1 Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom HOECHST AG (DE) 1996-11-20 EP disclosed
US-5424166-A Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom HOECHST AKTIENGESELLSCHAFT (DE) 1995-06-13 US disclosed
US-5340682-A Sensitive, heat resistant, noncorrosive HOECHST AKTIENGESELLSCHAFT (DE) 1994-08-23 US disclosed
EP-0444493-A2 Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1991-09-04 EP disclosed
EP-0417556-A2 Positive-working radiation-sensitive mixture and recording material prepared therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1991-03-20 EP disclosed