SCHEMBL9048102

SCHEMBL9048102

NS(=O)(=O)c1ccc(C(F)(F)F)cc1C(F)(F)F

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 3/20 0.55
CA2 P00918 3/20 0.55
CA9 Q16790 2/20 0.55
CA12 O43570 1/20 0.55
CA4 P22748 1/20 0.55
CA6 P23280 1/20 0.55
CA5A P35218 1/20 0.55
CA7 P43166 1/20 0.55
CA14 Q9ULX7 1/20 0.55
CA5B Q9Y2D0 1/20 0.55
KIF11 P52732 5/20 0.47
CES2 O00748 2/20 0.47
CNR2 P34972 1/20 0.45
LMNA P02545 2/20 0.44
AR P10275 1/20 0.44
PTGES2 Q9H7Z7 3/20 0.43
ALOX5AP P20292 1/20 0.42
FEN1 P39748 1/20 0.42
TRPV4 Q9HBA0 1/20 0.40
KDM4E B2RXH2 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29913652 0.85 CA1 (0.55) CA1CA2CA9CA12CA4
SCHEMBL18985068 0.85 CA1 (0.55) CA1CA2CA9CA12CA4
SCHEMBL29458370 0.81 PDIA6 (0.49) CA1CA2CA9CA12CA4
SCHEMBL4638383 0.81 CA12 (0.59) CA1CA2CA9CA12CA4
SCHEMBL29374110 0.81 TRPV4 (0.60) CA1CA2CA9CA12CA4
SCHEMBL9303098 0.81 ABCB11 (0.52) KIF11CES2ALOX5APFEN1TRPV4
SCHEMBL6684584 0.81 CA1 (0.55) CA1CA2CA9CA12CA4
SCHEMBL795545 0.81 CES2 (0.52) CA1CA2CA9CA12CA4
SCHEMBL6191403 0.81 PDIA6 (0.49) CA1CA2CA9CA12CA4
SCHEMBL30918492 0.81 KIF11 (0.47) CA1CA2CA9CA12CA4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230359119-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-09 US disclosed
US-20170184962-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-29 US disclosed
US-20170184964-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-29 US disclosed
US-20170184963-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-29 US disclosed
CN-106083978-A Sulfonyl amino carbonyl derivant, its pharmaceutical composition and application 上海迪诺医药科技有限公司 2016-11-09 CN disclosed
US-8980527-B2 Pattern forming process and resist compostion SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-03-17 US disclosed
EP-0510526-B1 Use of sulfonamides as drug and new sulfonamides HOFFMANN LA ROCHE (CH) 1996-12-04 EP disclosed
US-5270313-A Treatment of circulatory disorders HOFFMANN-LA ROCHE INC. (US) 1993-12-14 US disclosed
EP-0510526-A1 Use of sulfonamides as drug and new sulfonamides F.HOFFMANN-LA ROCHE & CO. AKTIENGESELLSCHAFT (CH) 1992-10-28 EP disclosed