Sugi Predict

Sugi Predict / Compounds / SCHEMBL795545

SCHEMBL795545

SCHEMBL795545

O=S(=O)(O)c1ccc(C(F)(F)F)cc1C(F)(F)F

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CES2 O00748 4/20 0.52
▸ FLT1 P17948 1/20 0.41
▸ FLT4 P35916 1/20 0.41
▸ KDR P35968 1/20 0.41
▸ ABCB11 O95342 1/20 0.40
▸ TRPV4 Q9HBA0 1/20 0.40
▸ CA1 P00915 2/20 0.39
▸ CA2 P00918 2/20 0.39
▸ MMP1 P03956 1/20 0.39
▸ MMP2 P08253 1/20 0.39
▸ MMP9 P14780 1/20 0.39
▸ MMP8 P22894 1/20 0.39
▸ MMP13 P45452 1/20 0.39
▸ CA12 O43570 1/20 0.38
▸ CA4 P22748 1/20 0.38
▸ CA6 P23280 1/20 0.38
▸ CA5A P35218 1/20 0.38
▸ CA7 P43166 1/20 0.38
▸ CA9 Q16790 1/20 0.38
▸ CA14 Q9ULX7 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27992215 0.85 MCL1 (0.48) CES2FLT1FLT4KDRALDH1A1
SCHEMBL3190051 0.85 CES2 (0.52) CES2FLT1FLT4KDRCA1
SCHEMBL3611597 0.81 TRPV4 (0.60) CES2FLT1FLT4KDRABCB11
SCHEMBL9303098 0.81 ABCB11 (0.52) CES2ABCB11TRPV4MCL1
SCHEMBL3206647 0.81 EPHX2 (0.42) TRPV4CA1CA2CA12CA4
SCHEMBL14600285 0.81 LMNA (0.41) TRPV4CA1CA2CA12CA4
SCHEMBL29374110 0.81 TRPV4 (0.60) CES2FLT1FLT4KDRABCB11
SCHEMBL9048102 0.81 CA1 (0.55) CES2TRPV4CA1CA2CA12
SCHEMBL3204736 0.81 PDE2A (0.43) CES2CA1CA2MMP1MMP2
SCHEMBL27855832 0.79 MRGPRX4 (0.47) TRPV4CA1CA2CA12CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 — — US claimed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 — — US claimed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 — — US claimed
US-11754927-B2 Photoresist pattern trimming compositions and pattern formation methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2023-09-12 — — US disclosed
US-11754927-B2 Photoresist pattern trimming compositions and pattern formation methods ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2023-09-12 — — US disclosed
US-20200379351-A1 PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2020-12-03 — — US disclosed
US-20200379353-A1 PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2020-12-03 — — US disclosed
CN-103069636-B Non-aqueous electrolyte, its autofrettage and use the non-aqueous electrolyte cell of this electrolyte WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2016-01-20 — — CN disclosed
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 — — US disclosed
US-20120070783-A1 RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN JSR CORPORATION (JP) 2012-03-22 — — US disclosed
US-20110014569-A1 RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER JSR CORPORATION (JP) 2011-01-20 — — US disclosed
US-7396960-B2 Sulfonium salts TOYO GOSEI CO., LTD. (JP) 2008-07-08 — — US disclosed
US-7371503-B2 Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2008-05-13 — — US disclosed
US-20070219368-A1 Sulfonium salts TOYO GOSEI CO., LTD. (JP) 2007-09-20 — — US disclosed
US-20060141383-A1 Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions JSR CORPORATION (JP) 2006-06-29 — — US disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 — — US disclosed
EP-1586570-A1 SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2005-10-19 — — EP disclosed
US-20050158657-A1 Radiation-sensitive resin composition SUZUKI AKI (JP) 2005-07-21 — — US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 — — US disclosed
US-20020090569-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-07-11 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11754927-B2 Photoresist pattern trimming compositions and pattern formation methods AHR, ALKBH1, CNOT1 CES2 1835/4885FLT1 454/4885FLT4 1028/4885
US-20070219368-A1 Sulfonium salts C1S, F12, C1R CES2 1659/4885FLT1 3689/4885FLT4 3969/4885
US-20200379353-A1 PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION METHODS AHR, ALKBH1, CNOT1 CES2 1835/4885FLT1 454/4885FLT4 1028/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.