SCHEMBL9703044

SCHEMBL9703044

Cc1ccc(S(=O)(=O)N(Cc2cccc([N+](=O)[O-])c2)c2ccccc2)cc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.60
ALDH1A1 P00352 2/20 0.60
NPSR1 Q6W5P4 1/20 0.60
HPGD P15428 1/20 0.59
HTT P42858 1/20 0.59
SMN1; SMN2 Q16637 1/20 0.59
PKM P14618 1/20 0.57
CNR2 P34972 3/20 0.57
NR3C1 P04150 2/20 0.57
CNR1 P21554 2/20 0.57
MEN1 O00255 1/20 0.55
KMT2A Q03164 1/20 0.55
L3MBTL1 Q9Y468 1/20 0.55
CYP1A2 P05177 2/20 0.55
CYP2C19 P33261 2/20 0.55
CYP3A4 P08684 1/20 0.55
HIF1A Q16665 1/20 0.54
EPAS1 Q99814 1/20 0.54
MAPT P10636 3/20 0.54
CYP2D6 P10635 1/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6553024 0.85 PKM (0.75) LMNAALDH1A1HPGDHTTSMN1; SMN2
SCHEMBL7335926 0.80 NR3C1 (0.64) LMNAALDH1A1NPSR1HTTPKM
SCHEMBL7335037 0.80 NR3C1 (0.58) LMNAALDH1A1NPSR1HPGDHTT
SCHEMBL8549210 0.77 NR3C1 (0.64) LMNAALDH1A1NPSR1HTTPKM
SCHEMBL7326548 0.77 NR3C1 (0.60) LMNAALDH1A1NPSR1PKMCNR2
SCHEMBL6295935 0.77 ESR1 (0.67) LMNAALDH1A1NPSR1HTTCNR2
SCHEMBL5461742 0.76 LMNA (0.65) LMNAALDH1A1NPSR1HPGDHTT
SCHEMBL27910100 0.75 ALDH1A1 (0.67) LMNAALDH1A1NPSR1HPGDHTT
SCHEMBL17064454 0.75 CRHBP (0.70) LMNAALDH1A1HTTSMN1; SMN2PKM
SCHEMBL27927859 0.75 ALDH1A1 (0.74) LMNAALDH1A1NPSR1HPGDHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5106718-A Heat resistant relief structures CIBA-GEIGY CORPORATION (US) 1992-04-21 US disclosed
EP-0364949-A2 Heat-stable positive photoresist CIBA-GEIGY AG (CH) 1990-04-25 EP disclosed