SCHEMBL9891455

SCHEMBL9891455

CC(C)(OC(=O)CCCNc1ccccc1)c1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.44
MAPT P10636 1/20 0.44
LMNA P02545 2/20 0.42
TOP2A P11388 2/20 0.40
CYP3A4 P08684 1/20 0.40
CYP2C9 P11712 1/20 0.40
KCNH2 Q12809 1/20 0.40
HDAC1 Q13547 2/20 0.39
HDAC3 O15379 1/20 0.39
HDAC2 Q92769 1/20 0.39
NCOR2 Q9Y618 1/20 0.39
CYP2C19 P33261 1/20 0.39
HIF1A Q16665 1/20 0.39
ALOX15 P16050 2/20 0.39
MAPK1 P28482 1/20 0.37
KDM4E B2RXH2 2/20 0.36
HTT P42858 2/20 0.36
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9891452 0.87 ALDH1A1 (0.48) ALDH1A1MAPTLMNATOP2AHDAC1
SCHEMBL15219206 0.84 ALDH1A1 (0.46) ALDH1A1MAPTLMNATOP2AHDAC1
SCHEMBL9891458 0.81 ALDH1A1 (0.42) ALDH1A1MAPTLMNATOP2ACYP3A4
SCHEMBL9891460 0.81 ALDH1A1 (0.42) ALDH1A1MAPTLMNATOP2ACYP3A4
SCHEMBL9756822 0.80 LMNA (0.60) ALDH1A1MAPTLMNATOP2AHDAC1
SCHEMBL3880018 0.78 ALDH1A1 (0.52) ALDH1A1MAPTCYP3A4HDAC1HDAC3
SCHEMBL30074233 0.78 CES2 (0.47) ALDH1A1CYP2C19HIF1AALOX15KDM4E
SCHEMBL5151596 0.77 POLB (0.44) ALDH1A1MAPTLMNATOP2APOLB
SCHEMBL9891445 0.77 PDK1 (0.47) ALDH1A1MAPTHDAC1HDAC3HDAC2
SCHEMBL18506508 0.77 CYP2C19 (0.47) ALDH1A1MAPTLMNAHDAC1HDAC3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8921026-B2 Basic compound, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-30 US disclosed
US-8921026-B2 Basic compound, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-12-30 US disclosed
EP-2463714-B1 Basic compound, chemically amplified resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2013-08-28 EP disclosed
EP-2463714-A1 Basic compound, chemically amplified resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2012-06-13 EP disclosed
US-20120141938-A1 BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-07 US disclosed
US-20120141938-A1 BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-06-07 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120141938-A1 BASIC COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS GABRA5, GABRB1, GABBR1 ALDH1A1 789/4885MAPT 2995/4885LMNA 2000/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.