SCHEMBL9950722

SCHEMBL9950722

CCC(Cc1ccccc1C1OCCO1)C1CCCCC1

nearest known ligand 0.32

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
SHBG P04278 1/20 0.32
KMT2A Q03164 1/20 0.32
PKM P14618 1/20 0.32
CTDSP1 Q9GZU7 1/20 0.32
NPC1 O15118 1/20 0.30
METAP2 P50579 2/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9952108 0.90 PKM (0.33) KMT2APKMCTDSP1
SCHEMBL9950624 0.87 PKM (0.33) SHBGKMT2APKMCTDSP1TSHR
SCHEMBL9951362 0.83 METAP2 (0.31) KMT2APKMCTDSP1METAP2
SCHEMBL9949401 0.76 ALDH1A1 (0.34) PKMCTDSP1TSHR
SCHEMBL9949746 0.74 ALDH1A1 (0.33) PKMCTDSP1
SCHEMBL9951341 0.73 KMT2A (0.36) SHBGKMT2APKMCTDSP1TSHR
SCHEMBL11941061 0.72 CTSB (0.43) KMT2ANPC1TSHR
SCHEMBL9949390 0.72 RAB9A (0.40) NPC1TSHR
SCHEMBL16191154 0.71 TDP1 (0.43) SHBGPKMCTDSP1NPC1
SCHEMBL9950213 0.71 CA1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8748078-B2 Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-06-10 US disclosed
EP-2476662-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN Mitsubishi Gas Chemical Company, Inc. (JP) 2012-07-18 EP disclosed
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-06-28 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120164576-A1 CYCLIC COMPOUND, PROCESS FOR PREPARATION THEREOF, RADIATION-SENSITIVE COMPOSITION, AND METHOD FOR FORMATION OF RESIST PATTERN RAD1, RER1, REV1 SHBG 2002/4885KMT2A 3487/4885PKM 1608/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.