Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16478907 | 1.00 | LMNA (0.35) | LMNA | |
| SCHEMBL18427238 | 1.00 | LMNA (0.35) | LMNA | |
| SCHEMBL18427233 | 1.00 | LMNA (0.35) | LMNA | |
| SCHEMBL19148317 | 1.00 | LMNA (0.35) | LMNA | |
| SCHEMBL12530888 | 1.00 | LMNA (0.35) | LMNA | |
| SCHEMBL20991725 | 1.00 | LMNA (0.35) | LMNA | |
| SCHEMBL18427222 | 1.00 | LMNA (0.35) | LMNA | |
| SCHEMBL18427274 | 1.00 | LMNA (0.35) | LMNA | |
| SCHEMBL18978687 | 1.00 | LMNA (0.35) | LMNA | |
| SCHEMBL20991695 | 1.00 | LMNA (0.35) | LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108933161-B | Organic light emitting diode display device | 乐金显示有限公司 | 2024-01-09 | — | — | CN | disclosed |
| US-20230250279-A1 | HARD COATING COMPOSITION AND WINDOW MEMBER | SAMSUNG DISPLAY CO., LTD. (KR) | 2023-08-10 | — | — | US | disclosed |
| CN-116507789-A | Polymeric dye-loaded tracers for drilling depth determination | 沙特阿拉伯石油公司 | 2023-07-28 | — | — | CN | disclosed |
| US-20230189636-A1 | COMPOUND FOR ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTRONIC ELEMENT USING THE SAME, AND AN ELECTRONIC DEVICE THEREOF | DUK SAN NEOLUX CO., LTD. (KR) | 2023-06-15 | — | — | US | disclosed |
| CN-116249807-A | Resin composition, nonwoven fabric, and fibrous product, separator for electric storage element, secondary battery, and electric double layer capacitor using same | 东丽株式会社 | 2023-06-09 | — | — | CN | disclosed |
| WO-2022097547-A1 | RESIN COMPOSITION, NONWOVEN FABRIC AND TEXTILE PRODUCT OBTAINED USING SAME, SEPARATOR FOR POWER STORAGE ELEMENT, SECONDARY BATTERY, AND ELECTRIC DOUBLE-LAYER CAPACITOR | 東レ株式会社 | 2022-05-12 | — | — | WO | disclosed |
| US-20210101875-A1 | AMINOALCOHOL LIPIDOIDS AND USES THEREOF | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2021-04-08 | — | — | US | disclosed |
| US-10844028-B2 | Aminoalcohol lipidoids and uses thereof | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2020-11-24 | — | — | US | disclosed |
| CN-106460027-B | Method for separating and concentrating target substance using cationic graft polymer | 日东纺绩株式会社 | 2020-07-31 | — | — | CN | disclosed |
| US-10392699-B2 | Method for manufacturing structure having recessed pattern, resin composition, method for forming electroconductive film, electronic circuit, and electronic device | JSR CORPORATION (JP) | 2019-08-27 | — | — | US | disclosed |
| US-20100099042-A1 | POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-04-22 | — | — | US | disclosed |
| US-20100099042-A1 | POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-04-22 | — | — | US | disclosed |
| US-20100055608-A1 | POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-04 | — | — | US | disclosed |
| US-7670751-B2 | Photoacid generator, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-02 | — | — | US | disclosed |
| US-20090233223-A1 | SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-09-17 | — | — | US | disclosed |
| US-20090233242-A1 | LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-09-17 | — | — | US | disclosed |
| US-20090191233-A1 | INFLUENZA ANTIGEN DELIVERY VECTORS AND CONSTRUCTS | IMMUNE TARGETING SYSTEMS LTD. | 2009-07-30 | — | — | US | disclosed |
| US-20090061358-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | PROXIMAL SYSTEMS CORPORATION | 2009-03-05 | — | — | US | disclosed |
| US-20080026331-A1 | Lactone-containing compound, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-01-31 | — | — | US | disclosed |
| US-20070264592-A1 | Resist polymer, preparing method, resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-11-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230189636-A1 | COMPOUND FOR ORGANIC ELECTRONIC ELEMENT, ORGANIC ELECTRONIC ELEMENT USING THE SAME, AND AN ELECTRONIC DEVICE THEREOF | EMC1, EMC2, EPCAM | LMNA 2531/4885 |
| US-20090061358-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | RER1, CRY1, CYP21A2 | LMNA 3801/4885 |
| US-20100099042-A1 | POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | ARSA, ACSL3, ASH2L | LMNA 2631/4885 |
| US-20090233242-A1 | LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | WDR5, RER1, H1-5 | LMNA 666/4885 |
| US-20100055608-A1 | POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | ARSA, ACSL3, RAD54L | LMNA 2856/4885 |
| US-20090191233-A1 | INFLUENZA ANTIGEN DELIVERY VECTORS AND CONSTRUCTS | LY96, CD74, HAVCR2 | LMNA 3780/4885 |
| US-20210101875-A1 | AMINOALCOHOL LIPIDOIDS AND USES THEREOF | PHOSPHO1, PNMT, AASDHPPT | LMNA 314/4885 |
| US-10844028-B2 | Aminoalcohol lipidoids and uses thereof | PHOSPHO1, PNMT, AASDHPPT | LMNA 314/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.