SCHEMBL1003495

SCHEMBL1003495

[CH2]CCCCCCCCCC/C=C/c1ccccc1

nearest known ligand 0.47

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 2/20 0.43
IDO1 P14902 2/20 0.42
PAM P19021 1/20 0.42
HDAC1 Q13547 3/20 0.41
HDAC8 Q9BY41 3/20 0.41
HDAC3 O15379 2/20 0.41
HDAC4 P56524 2/20 0.41
HDAC7 Q8WUI4 2/20 0.41
HDAC2 Q92769 2/20 0.41
HDAC10 Q969S8 2/20 0.41
HDAC11 Q96DB2 2/20 0.41
HDAC6 Q9UBN7 2/20 0.41
HDAC9 Q9UKV0 2/20 0.41
HDAC5 Q9UQL6 2/20 0.41
TBXAS1 P24557 1/20 0.41
HTR2A P28223 3/20 0.40
MAOB P27338 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL542493 1.00 SIGMAR1 (0.43) SIGMAR1IDO1PAMHDAC1HDAC8
SCHEMBL1003497 1.00 SIGMAR1 (0.43) SIGMAR1IDO1PAMHDAC1HDAC8
SCHEMBL542494 1.00 SIGMAR1 (0.43) SIGMAR1IDO1PAMHDAC1HDAC8
SCHEMBL21178175 0.98 SIGMAR1 (0.44) SIGMAR1IDO1PAMHDAC1HDAC8
SCHEMBL96607 0.92 SIGMAR1 (0.46) SIGMAR1IDO1PAMHDAC1HDAC8
SCHEMBL96606 0.92 SIGMAR1 (0.46) SIGMAR1IDO1PAMHDAC1HDAC8
SCHEMBL3795388 0.89 SIGMAR1 (0.50) SIGMAR1IDO1PAMHDAC1HDAC8
SCHEMBL5974675 0.84 SIGMAR1 (0.43) SIGMAR1IDO1PAMHDAC1HDAC8
SCHEMBL2243004 0.84 SIGMAR1 (0.43) SIGMAR1IDO1PAMHDAC1HDAC8
SCHEMBL28705255 0.84 SIGMAR1 (0.43) SIGMAR1IDO1PAMHDAC1HDAC8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20140275463-A1 ORGANOSILICON COMPOUND AND PRODUCTION PROCESS FOR THE SAME, AND POLYSILOXANE AND PRODUCTION PROCESS FOR THE SAME CHISSO PETROCHEMICAL CORPORATION (JP) 2014-09-18 US disclosed
EP-1548020-B1 SILICON COMPOUND JNC CORP (JP) 2014-07-23 EP disclosed
US-8367792-B2 Polysiloxane compound and method of producing the same JNC CORPORATION (JP) 2013-02-05 US disclosed
US-20120208973-A1 POLYSILOXANE COMPOUND AND METHOD OF PRODUCING THE SAME OOTAKE NOBUMASA (JP) 2012-08-16 US disclosed
EP-1550664-B1 SILICON COMPOUND JNC CORP (JP) 2012-06-27 EP disclosed
US-8173758-B2 Polysiloxane compound and method of producing the same JNC CORPORATION (JP) 2012-05-08 US disclosed
US-20110178313-A1 POLYSILOXANE COMPOUND AND METHOD OF PRODUCING THE SAME OOTAKE NOBUMASA 2011-07-21 US disclosed
US-7964692-B2 Polymer obtained by addition-polymerization initiated by a silicon compound JNC CORPORATION (JP) 2011-06-21 US disclosed
US-7939617-B2 Silsesquioxane derivative; electronic material, optical material, optoelectronic material, paint, and primer. CHISSO CORPORATION (JP) 2011-05-10 US disclosed
US-7863396-B2 Silicon compounds CHISSO CORPORATION (JP) 2011-01-04 US disclosed
US-20050288468-A1 Cyclic polysilsequisiloxanes substituted with a group containing a sulfonyl halide, especially ahalosulfonylphenyl group; living radical polymerization initiators, particularly for preparing acrylic polymers JNC CORPORATION (JP) 2005-12-29 US disclosed
US-20050250925-A1 Silicon compound JNC CORPORATION (JP) 2005-11-10 US disclosed
US-20050215807-A1 Silsesquioxane derivative JNC CORPORATION (JP) 2005-09-29 US disclosed
EP-1550664-A1 SILICON COMPOUND CHISSO CORPORATION (JP) 2005-07-06 EP disclosed
EP-1548020-A1 SILICON COMPOUND CHISSO CORPORATION (JP) 2005-06-29 EP disclosed
US-20050033077-A1 Production process for silicon compound and the same JNC CORPORATION (JP) 2005-02-10 US disclosed
US-20040249103-A1 Silsesquioxane derivatives and process for production thereof JNC CORPORATION (JP) 2004-12-09 US disclosed
EP-1428795-A1 SILSESQUIOXANE DERIVATIVES AND PROCESS FOR PRODUCTION THEREOF CHISSO CORPORATION (JP) 2004-06-16 EP disclosed
US-20040068074-A1 Production process for silsesquioxane derivative having functional group and silsesquioxane derivative JNC CORPORATION (JP) 2004-04-08 US disclosed
US-20040030084-A1 Production process for silsesquioxane derivative and silsesquioxane derivative JNC CORPORATION (JP) 2004-02-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110178313-A1 POLYSILOXANE COMPOUND AND METHOD OF PRODUCING THE SAME RPS4X, POLR2A, MSL1 SIGMAR1 184/4885IDO1 4256/4885PAM 1229/4885
US-20140275463-A1 ORGANOSILICON COMPOUND AND PRODUCTION PROCESS FOR THE SAME, AND POLYSILOXANE AND PRODUCTION PROCESS FOR THE SAME PIEZO1, PFAS, MCM6 SIGMAR1 880/4885IDO1 4399/4885PAM 3186/4885
US-20050215807-A1 Silsesquioxane derivative STS, SFXN1, SULT1A1 SIGMAR1 345/4885IDO1 2537/4885PAM 970/4885
US-20120208973-A1 POLYSILOXANE COMPOUND AND METHOD OF PRODUCING THE SAME RPS4X, POLR2A, MSL1 SIGMAR1 184/4885IDO1 4256/4885PAM 1229/4885
US-20050288468-A1 Cyclic polysilsequisiloxanes substituted with a group containing a sulfonyl halide, especially ahalosulfonylphenyl group; living radical polymerization initiators, particularly for preparing acrylic polymers STS, SULT1A1, SRM SIGMAR1 16/4885IDO1 2383/4885PAM 173/4885
US-20050033077-A1 Production process for silicon compound and the same STS, SMS, SFXN1 SIGMAR1 390/4885IDO1 1199/4885PAM 1431/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.