SCHEMBL10114699

SCHEMBL10114699

Cc1ccc2[nH]c3ccc(C(C)c4cccc5ccccc45)cc3c2c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.46
NPC1 O15118 1/20 0.46
POLB P06746 1/20 0.46
KMT2A Q03164 1/20 0.46
KIF11 P52732 3/20 0.43
ADRA2A P08913 4/20 0.41
ADRA2B P18089 4/20 0.41
ADRA2C P18825 4/20 0.41
ADRA1A P35348 2/20 0.41
ADRA1D P25100 1/20 0.41
ADRA1B P35368 1/20 0.41
MLKL Q8NB16 1/20 0.40
CASR P41180 2/20 0.40
ACHE P22303 1/20 0.39
CYP1A2 P05177 1/20 0.38
CYP2A6 P11509 1/20 0.38
GABRP O00591 1/20 0.38
GABRD O14764 1/20 0.38
GABRA1 P14867 1/20 0.38
GABRB1 P18505 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10114727 0.85 MEN1 (0.36) MEN1NPC1POLBKMT2AKIF11
SCHEMBL10114728 0.84 MEN1 (0.35) MEN1NPC1POLBKMT2AKIF11
SCHEMBL10114714 0.83 NPC1 (0.48) MEN1NPC1POLBKMT2AKIF11
SCHEMBL10114707 0.80 MLKL (0.52) MEN1NPC1POLBKMT2AKIF11
SCHEMBL10114767 0.77 MAPT (0.41) MEN1POLBKMT2A
SCHEMBL10130992 0.77 KIF11 (0.51) KIF11ADRA2AADRA2BADRA2CADRA1A
SCHEMBL10114722 0.76 BCHE (0.50) MEN1NPC1POLBKMT2AKIF11
SCHEMBL14946148 0.76 CYP1A2 (0.35) ADRA2AADRA2BADRA2CADRA1AADRA1D
SCHEMBL16451445 0.76 RAB9A (0.44) MEN1NPC1POLBKMT2AADRA2A
SCHEMBL16945418 0.76 LMNA (0.42) MEN1POLBKMT2AADRA2AADRA2B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230298923-A1 MULTILAYER BODY, RELEASE AGENT COMPOSITION, AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE NISSAN CHEMICAL CORPORATION (JP) 2023-09-21 US disclosed
US-8722841-B2 Carbazole novolak resin NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-05-13 US disclosed
US-8674052-B2 Carbazole novolak resin NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-03-18 US disclosed
US-20130122710-A1 CARBAZOLE NOVOLAK RESIN NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2013-05-16 US disclosed
US-20120077345-A1 CARBAZOLE NOVOLAK RESIN NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-03-29 US disclosed