Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | P2RX4 | Q99571 | 2/20 | 0.61 |
| ▸ | LMNA | P02545 | 2/20 | 0.52 |
| ▸ | MAPT | P10636 | 2/20 | 0.52 |
| ▸ | HTT | P42858 | 2/20 | 0.52 |
| ▸ | PTGS2 | P35354 | 4/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.49 |
| ▸ | MEN1 | O00255 | 1/20 | 0.49 |
| ▸ | HPGD | P15428 | 1/20 | 0.49 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.49 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.49 |
| ▸ | ABCB1 | P08183 | 2/20 | 0.42 |
| ▸ | AGTR1 | P30556 | 1/20 | 0.41 |
| ▸ | NTRK1 | P04629 | 1/20 | 0.41 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13144176 | 0.93 | LMNA (0.60) | P2RX4LMNAMAPTHTTPTGS2 | |
| SCHEMBL10178704 | 0.82 | PTGS2 (0.54) | P2RX4PTGS2ALDH1A1NTRK1 | |
| SCHEMBL10180106 | 0.80 | PTGS2 (0.52) | P2RX4LMNAPTGS2ALDH1A1MEN1 | |
| SCHEMBL13144229 | 0.78 | LMNA (0.49) | P2RX4LMNAMAPTHTTALDH1A1 | |
| SCHEMBL12611492 | 0.77 | P2RX4 (1.00) | P2RX4LMNAMAPTHTTALDH1A1 | |
| SCHEMBL6722016 | 0.75 | P2RX4 (0.64) | P2RX4PTGS2ALDH1A1MEN1KMT2A | |
| SCHEMBL10180072 | 0.74 | PTGS2 (0.45) | P2RX4LMNAHTTPTGS2ALDH1A1 | |
| SCHEMBL13144182 | 0.73 | LMNA (0.44) | LMNAMAPTALDH1A1KMT2ASMN1; SMN2 | |
| SCHEMBL13144174 | 0.72 | ALDH1A1 (0.44) | LMNAMAPTALDH1A1MEN1KMT2A | |
| SCHEMBL10178700 | 0.72 | HTR7 (0.45) | LMNAPTGS2ALDH1A1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7799506-B2 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2010-09-21 | — | — | US | disclosed |
| US-20090087776-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-04-02 | — | — | US | disclosed |