SCHEMBL10452005

SCHEMBL10452005

O=C(c1cc(CO)c(O)c(CO)c1)c1cc(CO)c(O)c(CO)c1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PKM P14618 2/20 0.45
KDM4E B2RXH2 1/20 0.45
CASP6 P55212 1/20 0.45
ALDH1A1 P00352 1/20 0.41
SHBG P04278 1/20 0.39
CYBB P04839 1/20 0.37
FASN P49327 2/20 0.36
MMP2 P08253 1/20 0.35
MMP3 P08254 1/20 0.35
CNR2 P34972 1/20 0.35
PTGS2 P35354 1/20 0.35
ESR1 P03372 1/20 0.35
ESR2 Q92731 1/20 0.35
LMNA P02545 1/20 0.35
MAPT P10636 1/20 0.35
HPGD P15428 1/20 0.35
HTT P42858 1/20 0.35
GABRA1 P14867 1/20 0.34
GABRB1 P18505 1/20 0.34
HDAC1 Q13547 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2123786 0.83 ALDH1A1 (0.59) PKMKDM4ECASP6ALDH1A1PTGS2
SCHEMBL8092896 0.80 GABRA1 (0.48) PKMALDH1A1FASNCNR2LMNA
SCHEMBL11061298 0.76 KDM4E (0.59) PKMKDM4EALDH1A1CNR2LMNA
SCHEMBL10548309 0.73 PKM (0.48) PKMALDH1A1PTGS2ESR1ESR2
SCHEMBL2123617 0.73 CA12 (0.61) ALDH1A1ESR1ESR2LMNAMAPT
SCHEMBL16077680 0.73 CA12 (0.64) PKMKDM4ECASP6ALDH1A1CYBB
SCHEMBL835866 0.73 KDM4E (0.46) PKMKDM4ECASP6ALDH1A1SHBG
SCHEMBL26132747 0.73 KDM4E (0.46) PKMKDM4ECASP6ALDH1A1SHBG
SCHEMBL9999531 0.73 ACHE (0.48) PKMKDM4ECASP6ALDH1A1SHBG
SCHEMBL27420314 0.72 MAPT (0.42) PKMKDM4EALDH1A1FASNLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10241412-B2 Resist underlayer film composition, patterning process, and method for forming resist underlayer film SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-03-26 US disclosed
US-9090119-B2 Pattern forming method JSR CORPORATION (JP) 2015-07-28 US disclosed
US-9090119-B2 Pattern forming method JSR CORPORATION (JP) 2015-07-28 US disclosed
US-20140224765-A1 PATTERN FORMING METHOD JSR CORPORATION (JP) 2014-08-14 US disclosed
US-20140224765-A1 PATTERN FORMING METHOD JSR CORPORATION (JP) 2014-08-14 US disclosed
US-20120181251-A1 PATTERN FORMING METHOD AND RESIST UNDERLAYER FILM-FORMING COMPOSITION JSR CORPORATION (JP) 2012-07-19 US disclosed
US-20120181251-A1 PATTERN FORMING METHOD AND RESIST UNDERLAYER FILM-FORMING COMPOSITION JSR CORPORATION (JP) 2012-07-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10241412-B2 Resist underlayer film composition, patterning process, and method for forming resist underlayer film GPX4, PLOD1, AQP1 PKM 3113/4885KDM4E 395/4885CASP6 3279/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.