Phosphonic Acid

Phosphonic Acid

SCHEMBL1060959

CNC(=O)c1ccc(OC)cc1.O=[PH](O)O

nearest known ligand 0.85

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PLK1 P53350 3/20 0.85
SMN1; SMN2 Q16637 3/20 0.63
HPGD P15428 1/20 0.63
TSHR P16473 1/20 0.63
HTT P42858 1/20 0.63
CA1 P00915 4/20 0.61
CA2 P00918 4/20 0.61
CYP1A2 P05177 2/20 0.59
CYP3A4 P08684 2/20 0.59
CYP2C9 P11712 2/20 0.59
CYP2C19 P33261 2/20 0.59
PKM P14618 1/20 0.59
NPC1 O15118 3/20 0.58
RAB9A P51151 3/20 0.58
TP53 P04637 2/20 0.58
ALOX15 P16050 1/20 0.58
MMP13 P45452 1/20 0.56
F10 P00742 1/20 0.54
CRHBP P24387 1/20 0.54
CRHR2 Q13324 1/20 0.54

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL837307 0.92 PLK1 (1.00) PLK1SMN1; SMN2HPGDTSHRHTT
Hydrochloric Acid SCHEMBL11037223 0.90 PLK1 (0.96) PLK1SMN1; SMN2HPGDTSHRHTT
SCHEMBL23484773 0.87 PLK1 (0.89) PLK1SMN1; SMN2HPGDTSHRHTT
SCHEMBL14722006 0.87 PLK1 (0.89) PLK1SMN1; SMN2HPGDTSHRHTT
SCHEMBL8717056 0.82 PLK1 (0.80) PLK1SMN1; SMN2HTTCA1CA2
SCHEMBL5582971 0.80 PLK1 (0.74) PLK1SMN1; SMN2HPGDTSHRHTT
SCHEMBL4754917 0.78 ALDH1A1 (0.78) PLK1SMN1; SMN2HTTCA1CA2
SCHEMBL11705060 0.78 MAPT (0.79) PLK1SMN1; SMN2HPGDCA1CA2
SCHEMBL2645679 0.78 HPGD (0.76) PLK1SMN1; SMN2HPGDTSHRHTT
SCHEMBL13184545 0.78 HPGD (1.00) PLK1SMN1; SMN2HPGDTSHRHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2383264-B1 EPOXY COMPOUND PRODUCTION METHOD SHOWA DENKO KK (JP) 2015-03-04 EP disclosed
US-8536352-B2 Method of producing epoxy compounds SHOWA DENKO K.K. (JP) 2013-09-17 US disclosed
US-8466303-B2 Process for production of epoxy compound SHOWA DENKO K.K. (JP) 2013-06-18 US disclosed
EP-2383264-A1 EPOXY COMPOUND PRODUCTION METHOD Showa Denko K.K. (JP) 2011-11-02 EP disclosed
US-20110263882-A1 METHOD OF PRODUCING EPOXY COMPOUNDS SHOWA DENKO K.K. (JP) 2011-10-27 US disclosed
US-20110009652-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND SHOWA DENKO KK (JP) 2011-01-13 US disclosed
EP-2261219-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND Showa Denko K.K. (JP) 2010-12-15 EP disclosed
EP-0537786-B1 Preparation of N-acylaminomethylphosphonic acid SHOWA DENKO KK (JP) 1998-01-21 EP disclosed
US-5453537-A Method for preparing an N-phosphonomethylglycine SHOWA DENKO K.K. (JP) 1995-09-26 US disclosed
US-5324855-A Mixing an N-methylolamide with phosphorus trihalide in aprotic solvent, in presence of water, heating, then adding more water, efficiency, simplification SHOWA DENKO K.K. (JP) 1994-06-28 US disclosed
EP-0537786-A1 Preparation of N-acylaminomethylphosphonic acid SHOWA DENKO KABUSHIKI KAISHA (JP) 1993-04-21 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110263882-A1 METHOD OF PRODUCING EPOXY COMPOUNDS AOX1, NOX4, AOC2 PLK1 3279/4885SMN1; SMN2 4475/4885HPGD 109/4885
US-20110009652-A1 PROCESS FOR PRODUCTION OF EPOXY COMPOUND DUOX2, EPX, DUOX1 PLK1 2866/4885SMN1; SMN2 3907/4885HPGD 90/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.