Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2A | P28223 | 2/20 | 0.33 |
| ▸ | HTR7 | P34969 | 2/20 | 0.33 |
| ▸ | HTR1A | P08908 | 1/20 | 0.33 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.33 |
| ▸ | HTR6 | P50406 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 3/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.32 |
| ▸ | SCN8A | Q9UQD0 | 2/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.32 |
| ▸ | SCN4A | P35499 | 2/20 | 0.31 |
| ▸ | LMNA | P02545 | 2/20 | 0.31 |
| ▸ | MAPT | P10636 | 2/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL31564932 | 0.87 | GPR3 (0.31) | — | |
| SCHEMBL13018285 | 0.84 | KDM4E (0.33) | MAPTKDM4EALDH1A1 | |
| SCHEMBL5117625 | 0.82 | — | — | |
| SCHEMBL10170775 | 0.79 | LTA4H (0.46) | MEN1KMT2ASCN8AATMLMNA | |
| SCHEMBL13052218 | 0.78 | SCN4A (0.38) | HTR2AHTR7HTR1AADRA1AHTR6 | |
| Hydrochloric Acid SCHEMBL29816199 | 0.78 | SCN4A (0.36) | HTR2AHTR7HTR1AADRA1AHTR6 | |
| SCHEMBL2569745 | 0.77 | THRB (0.41) | MEN1KMT2ALMNAMAPTL3MBTL1 | |
| SCHEMBL8797779 | 0.77 | THRB (0.41) | MEN1KMT2ALMNAMAPTL3MBTL1 | |
| SCHEMBL98571 | 0.77 | ALDH1A1 (0.41) | SCN4AMAPTL3MBTL1KDM4EALDH1A1 | |
| SCHEMBL98712 | 0.77 | THRA (0.47) | HTR2AHTR1AMEN1KMT2AATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9012129-B2 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JO) | 2015-04-21 | — | — | US | disclosed |
| US-8808959-B2 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20140120472-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-05-01 | — | — | US | disclosed |
| US-8415085-B2 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-09 | — | — | US | disclosed |
| US-8298748-B2 | Positive resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-10-30 | — | — | US | disclosed |
| US-20120264061-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-10-18 | — | — | US | disclosed |
| US-20100297560-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-11-25 | — | — | US | disclosed |
| US-20100119974-A1 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. | 2010-05-13 | — | — | US | disclosed |
| US-7396960-B2 | Sulfonium salts | TOYO GOSEI CO., LTD. (JP) | 2008-07-08 | — | — | US | disclosed |
| US-20070219368-A1 | Sulfonium salts | TOYO GOSEI CO., LTD. (JP) | 2007-09-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120264061-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | C1R, RER1, ASIC1 | HTR2A 4477/4885HTR7 4639/4885HTR1A 3616/4885 |
| US-20100119974-A1 | Resist composition, method of forming resist pattern, novel compound, and acid generator | C1R, SCO2, RER1 | HTR2A 4463/4885HTR7 4612/4885HTR1A 3776/4885 |
| US-20070219368-A1 | Sulfonium salts | C1S, F12, C1R | HTR2A 3777/4885HTR7 1283/4885HTR1A 2126/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.