Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.47 |
| ▸ | MAOA | P21397 | 1/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | BCHE | P06276 | 2/20 | 0.37 |
| ▸ | CES1 | P23141 | 1/20 | 0.37 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.37 |
| ▸ | CHEK1 | O14757 | 1/20 | 0.37 |
| ▸ | DAPK3 | O43293 | 1/20 | 0.37 |
| ▸ | LTK | P29376 | 1/20 | 0.37 |
| ▸ | MAPK8 | P45983 | 1/20 | 0.37 |
| ▸ | CSNK1A1 | P48729 | 1/20 | 0.37 |
| ▸ | CDK8 | P49336 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1344620 | 1.00 | ALDH1A1 (0.47) | ALDH1A1CYP1A2CYP2C19MAOAHPGD | |
| SCHEMBL12757741 | 1.00 | ALDH1A1 (0.47) | ALDH1A1CYP1A2CYP2C19MAOAHPGD | |
| SCHEMBL4000976 | 0.72 | MAOA (0.48) | ALDH1A1CYP1A2CYP2C19MAOAHPGD | |
| SCHEMBL10640017 | 0.67 | ALDH1A1 (0.42) | ALDH1A1CYP1A2CYP2C19MAOAHPGD | |
| SCHEMBL84394 | 0.66 | NOS3 (0.65) | ALDH1A1CYP1A2MAOAKDM4ENPC1 | |
| SCHEMBL6270102 | 0.66 | MEN1 (0.61) | ALDH1A1CYP1A2CYP2C19MAOAHPGD | |
| SCHEMBL30042976 | 0.64 | ALDH1A1 (1.00) | ALDH1A1CYP1A2CYP2C19MAOAHPGD | |
| SCHEMBL7885392 | 0.64 | ALDH1A1 (1.00) | ALDH1A1CYP1A2CYP2C19MAOAHPGD | |
| SCHEMBL2281241 | 0.64 | ALDH1A1 (1.00) | ALDH1A1CYP1A2CYP2C19MAOAHPGD | |
| SCHEMBL2281246 | 0.64 | ALDH1A1 (1.00) | ALDH1A1CYP1A2CYP2C19MAOAHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8062429-B2 | Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions | EKC TECHNOLOGY, INC. (US) | 2011-11-22 | — | — | US | claimed |
| EP-2207750-A1 | STABILIZATION OF HYDROXYLAMINE CONTAINING SOLUTIONS AND METHOD FOR THEIR PREPARATION | EKC Technology, INC. (US) | 2010-07-21 | — | — | EP | claimed |
| EP-2207872-A1 | NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION | EKC Technology, INC. (US) | 2010-07-21 | — | — | EP | claimed |
| US-20100043823-A1 | METHODS OF CLEANING SEMICONDUCTOR DEVICES AT THE BACK END OF LINE USING AMIDOXIME COMOSITIONS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2010-02-25 | — | — | US | claimed |
| US-20090130849-A1 | CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE | EKC TECHNOLOGY, INC. | 2009-05-21 | — | — | US | claimed |
| WO-2009058274-A1 | CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | claimed |
| WO-2009058273-A1 | STABILIZATION OF HYDROXYLAMINE CONTAINING SOLUTIONS AND METHOD FOR THEIR PREPARATION | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | claimed |
| WO-2009058278-A1 | METHODS OF CLEANING SEMICONDUCTOR DEVICES AT THE BACK END OF LINE USING AMIDOXIME COMPOSITIONS | EKC TECHNOLOGY, INC (US) | 2009-05-07 | — | — | WO | claimed |
| WO-2009058277-A1 | NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | claimed |
| US-20090112024-A1 | STABILIZATION OF HYDROXYLAMINE CONTAINING SOLUTIONS AND METHOD FOR THEIR PREPARATION | EKC TECHNOLOGY, INC. | 2009-04-30 | — | — | US | claimed |
| US-20090111965-A1 | NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION | EKC TECHNOLOGY, INC. | 2009-04-30 | — | — | US | claimed |
| US-8802609-B2 | Nitrile and amidoxime compounds and methods of preparation for semiconductor processing | EKC TECHNOLOGY INC | 2014-08-12 | — | — | US | disclosed |
| US-20130035272-A1 | NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION FOR SEMICONDUCTOR PROCESSING | EKC TECHNOLOGY INC. | 2013-02-07 | — | — | US | disclosed |
| US-8062429-B2 | Methods of cleaning semiconductor devices at the back end of line using amidoxime compositions | EKC TECHNOLOGY, INC. (US) | 2011-11-22 | — | — | US | disclosed |
| US-20110065622-A1 | NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION FOR SEMICONDUCTOR PROCESSING | EKC TECHNOLOGY, INC. | 2011-03-17 | — | — | US | disclosed |
| WO-2009058274-A1 | CHEMICAL MECHANICAL POLISHING AND WAFER CLEANING COMPOSITION COMPRISING AMIDOXIME COMPOUNDS AND ASSOCIATED METHOD FOR USE | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | disclosed |
| WO-2009058272-A1 | COPPER CMP POLISHING PAD CLEANING COMPOSITION COMPRISING OF AMIDOXIME COMPOUNDS | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | disclosed |
| WO-2009058287-A1 | PROCESS OF PURIFICATION OF AMIDOXIME CONTAINING CLEANING SOLUTIONS AND THEIR USE | EKC TECHNOLOGY, INC. (US) | 2009-05-07 | — | — | WO | disclosed |
| US-20090112024-A1 | STABILIZATION OF HYDROXYLAMINE CONTAINING SOLUTIONS AND METHOD FOR THEIR PREPARATION | EKC TECHNOLOGY, INC. | 2009-04-30 | — | — | US | disclosed |
| US-20090111965-A1 | NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION | EKC TECHNOLOGY, INC. | 2009-04-30 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110065622-A1 | NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION FOR SEMICONDUCTOR PROCESSING | TNNI3K, TNK1, NIT2 | ALDH1A1 4597/4885CYP1A2 1796/4885CYP2C19 1438/4885 |
| US-20090112024-A1 | STABILIZATION OF HYDROXYLAMINE CONTAINING SOLUTIONS AND METHOD FOR THEIR PREPARATION | HNMT, HMOX2, EGLN2 | ALDH1A1 801/4885CYP1A2 115/4885CYP2C19 279/4885 |
| US-20090111965-A1 | NOVEL NITRILE AND AMIDOXIME COMPOUNDS AND METHODS OF PREPARATION | GNMT, NIT2, NNMT | ALDH1A1 3167/4885CYP1A2 173/4885CYP2C19 320/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.