Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.41 |
| ▸ | LMNA | P02545 | 3/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.38 |
| ▸ | ACHE | P22303 | 2/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.34 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | NSD2 | O96028 | 1/20 | 0.34 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13683051 | 0.89 | ELANE (0.40) | LMNAL3MBTL1MAPK1MAPTALDH1A1 | |
| SCHEMBL13683043 | 0.86 | CHRNB2 (0.43) | CYP3A4KDM4EL3MBTL1MAPK1TDP1 | |
| SCHEMBL13683039 | 0.85 | L3MBTL1 (0.50) | KDM4ELMNAL3MBTL1MAPK1TDP1 | |
| SCHEMBL13683041 | 0.85 | TDP1 (0.44) | KDM4ETDP1TSHRMTNR1AMTNR1B | |
| SCHEMBL13683056 | 0.83 | HDAC1 (0.46) | KDM4E | |
| SCHEMBL13683066 | 0.81 | PPARG (0.47) | KDM4EMAPK1MAPTTDP1ALDH1A1 | |
| SCHEMBL13683053 | 0.81 | PTGS2 (0.38) | KDM4ELMNATDP1ALDH1A1TSHR | |
| SCHEMBL18135084 | 0.80 | CYP3A4 (0.57) | CYP3A4LMNAACHEMAPTTDP1 | |
| SCHEMBL13683037 | 0.78 | MEN1 (0.47) | CYP3A4LMNAL3MBTL1MAPTALDH1A1 | |
| SCHEMBL13683046 | 0.78 | CHRM2 (0.41) | LMNAMAPK1ALDH1A1TSHRSMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7592118-B2 | Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |
| US-20080241743-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |