Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.41 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 2/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | LMNA | P02545 | 2/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.39 |
| ▸ | PPARG | P37231 | 1/20 | 0.39 |
| ▸ | PPARA | Q07869 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | DRD2 | P14416 | 1/20 | 0.39 |
| ▸ | DRD4 | P21917 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13683043 | 0.89 | CHRNB2 (0.43) | L3MBTL1TDP1KDM4EKMT2AMAPK1 | |
| SCHEMBL13683041 | 0.87 | TDP1 (0.44) | TDP1SMN1; SMN2KDM4EPPARGPPARA | |
| SCHEMBL13683037 | 0.85 | MEN1 (0.47) | L3MBTL1SMN1; SMN2GAAKMT2ALMNA | |
| SCHEMBL13683056 | 0.85 | HDAC1 (0.46) | KDM4E | |
| SCHEMBL13683049 | 0.85 | CYP3A4 (0.43) | L3MBTL1TDP1SMN1; SMN2KDM4EKMT2A | |
| SCHEMBL13683066 | 0.82 | PPARG (0.47) | TDP1SMN1; SMN2POLBKDM4EKMT2A | |
| SCHEMBL13683046 | 0.80 | CHRM2 (0.41) | SMN1; SMN2LMNAMAPK1 | |
| SCHEMBL13683058 | 0.80 | NPC1 (0.46) | SMN1; SMN2LMNA | |
| SCHEMBL13683038 | 0.80 | L3MBTL1 (0.52) | L3MBTL1TDP1SMN1; SMN2POLBGAA | |
| SCHEMBL11306567 | 0.79 | KDM4E (0.48) | TDP1SMN1; SMN2KDM4EKMT2ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7592118-B2 | Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |
| US-20080241743-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |