Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.50 |
| ▸ | CYP2A6 | P11509 | 3/20 | 0.50 |
| ▸ | TSHR | P16473 | 2/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | HPRT1 | P00492 | 1/20 | 0.46 |
| ▸ | POLB | P06746 | 1/20 | 0.45 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.42 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.42 |
| ▸ | DNMT1 | P26358 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.39 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 1,2-Naphthoquinone SCHEMBL2146624 | 0.75 | ALDH1A1 (0.55) | ALDH1A1HSD17B10CYP2A6TSHRTDP1 | |
| SCHEMBL1239327 | 0.75 | ALDH1A1 (0.55) | ALDH1A1HSD17B10CYP2A6TSHRTDP1 | |
| SCHEMBL30361992 | 0.75 | ALDH1A1 (0.55) | ALDH1A1HSD17B10CYP2A6TSHRTDP1 | |
| SCHEMBL1187756 | 0.75 | POLB (0.60) | ALDH1A1HSD17B10CYP2A6TSHRTDP1 | |
| SCHEMBL4630201 | 0.71 | ALDH1A1 (0.52) | ALDH1A1HSD17B10CYP2A6TSHRTDP1 | |
| SCHEMBL5950409 | 0.71 | ALDH1A1 (0.50) | ALDH1A1HSD17B10CYP2A6TSHRTDP1 | |
| SCHEMBL1643179 | 0.71 | PTPN22 (0.60) | ALDH1A1HSD17B10CYP2A6TSHRTDP1 | |
| SCHEMBL1243989 | 0.71 | CYP2A6 (0.60) | ALDH1A1HSD17B10CYP2A6TSHRTDP1 | |
| SCHEMBL15453239 | 0.71 | ALDH1A1 (0.50) | ALDH1A1HSD17B10CYP2A6TSHRTDP1 | |
| SCHEMBL3258973 | 0.71 | PTPN22 (0.60) | ALDH1A1HSD17B10CYP2A6TSHRTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10745372-B2 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-08-18 | — | — | US | claimed |
| US-4246172-A | FOR DYEING TEXTILES SUCH AS POLYACRYLONITRILE, AND ACID MODIFIED POLYESTERS AND POLYAMIDES | BAYER AKTIENGESELLSCHAFT (DE) | 1981-01-20 | — | — | US | claimed |
| US-4039539-A | 1,2,4-Triazole-azo-aniline cationic dyestuffs | BAYER AKTIENGESELLSCHAFT (DT) | 1977-08-02 | — | — | US | claimed |
| EP-2123695-B1 | METAL THIETANE COMPOUND, POLYMERIZABLE COMPOSITION COMPRISING THE COMPOUND, RESIN, AND USE OF THE RESIN | MITSUI CHEMICALS INC (JP) | 2021-06-23 | — | — | EP | disclosed |
| EP-2841429-B1 | TETRAZOLINONE COMPOUNDS AND ITS USE AS PESTICIDES | SUMITOMO CHEMICAL CO (JP) | 2020-10-21 | — | — | EP | disclosed |
| US-10745372-B2 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-08-18 | — | — | US | disclosed |
| US-10451967-B2 | Acid- and radical-generating agent and method for generating acid and radical | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-22 | — | — | US | disclosed |
| US-20180029968-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND PURIFICATION METHOD OF COMPOUND OR RESIN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-02-01 | — | — | US | disclosed |
| EP-3257835-A1 | COMPOUND, RESIN, LITHOGRAPHY UNDERLAYER FILM FORMING MATERIAL, LITHOGRAPHY UNDERLAYER FILM FORMING COMPOSITION, LITHOGRAPHY UNDERLAYER FILM, METHOD FOR FORMING RESIST PATTERN, METHOD FOR FORMING CIRCUIT PATTERN, AND METHOD FOR PURIFYING COMPOUND OR RESIN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2017-12-20 | — | — | EP | disclosed |
| US-20170349564-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND PURIFICATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2017-12-07 | — | — | US | disclosed |
| EP-3239141-A1 | COMPOUND, RESIN, UNDERLAYER FILM FORMING MATERIAL FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD AND PURIFICATION METHOD | Mitsubishi Gas Chemical Company, Inc. (JP) | 2017-11-01 | — | — | EP | disclosed |
| EP-2006319-A9 | POLYMERIZABLE COMPOSITION, RESIN USING SAME, OPTICAL COMPONENT AND LENS | Mitsui Chemicals, Inc. (JP) | 2009-07-08 | — | — | EP | disclosed |
| US-20090076208-A1 | POLYMERIZABLE COMPOSITION, RESIN USING SAME, OPTICAL COMPONENT AND LENS | MITSUI CHEMICALS, INC. (JP) | 2009-03-19 | — | — | US | disclosed |
| EP-2036951-A1 | POLYMERIZABLE COMPOSITION, RESIN USING THE SAME, OPTICAL COMPONENT AND LENS | Mitsui Chemicals, Inc. (JP) | 2009-03-18 | — | — | EP | disclosed |
| EP-2014700-A1 | POLYMERIZABLE COMPOSITION, RESIN USING THE SAME AND OPTICAL COMPONENT | Mitsui Chemicals, Inc. (JP) | 2009-01-14 | — | — | EP | disclosed |
| EP-2006319-A2 | POLYMERIZABLE COMPOSITION, RESIN USING SAME, OPTICAL COMPONENT AND LENS | Mitsui Chemicals, Inc. (JP) | 2008-12-24 | — | — | EP | disclosed |
| US-20080027198-A1 | Metal-Containing Compound and Use Thereof | MITSUI CHEMICALS, INC. (JP) | 2008-01-31 | — | — | US | disclosed |
| US-20070191615-A1 | Polymerizable compound and use thereof | MITSUI CHEMICALS, INC. (JP) | 2007-08-16 | — | — | US | disclosed |
| EP-1813639-A1 | METAL-CONTAINING COMPOUND AND USE THEREOF | Mitsui Chemicals, Inc. (JP) | 2007-08-01 | — | — | EP | disclosed |
| EP-1731547-A1 | POLYMERIZABLE COMPOUNDS AND USE THEREOF | Mitsui Chemicals, Inc. (JP) | 2006-12-13 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10451967-B2 | Acid- and radical-generating agent and method for generating acid and radical | CBR1, HAO2, CBR3 | ALDH1A1 151/4885HSD17B10 339/4885CYP2A6 375/4885 |
| US-20170349564-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, PATTERN FORMING METHOD, AND PURIFICATION METHOD | ASH2L, MLLT1, FRG1 | ALDH1A1 1912/4885HSD17B10 1750/4885CYP2A6 1906/4885 |
| US-20180029968-A1 | COMPOUND, RESIN, MATERIAL FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, COMPOSITION FOR FORMING UNDERLAYER FILM FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, RESIST PATTERN FORMING METHOD, CIRCUIT PATTERN FORMING METHOD, AND PURIFICATION METHOD OF COMPOUND OR RESIN | PRMT9, ARGLU1, MLLT1 | ALDH1A1 1309/4885HSD17B10 3367/4885CYP2A6 2371/4885 |
| US-20070191615-A1 | Polymerizable compound and use thereof | RPS4X, MLX, RPS4Y1 | ALDH1A1 3156/4885HSD17B10 4748/4885CYP2A6 3602/4885 |
| US-20080027198-A1 | Metal-Containing Compound and Use Thereof | HSPH1, HSPA4L, PTCD3 | ALDH1A1 2543/4885HSD17B10 3994/4885CYP2A6 4430/4885 |
| US-10745372-B2 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and purification method | ASH2L, MLLT1, FRG1 | ALDH1A1 1912/4885HSD17B10 1750/4885CYP2A6 1906/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.