SCHEMBL16020249

SCHEMBL16020249

CC(CS(=O)(=O)O)(OC(=O)c1ccccc1C(=O)O)C(F)(F)F

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.40
KMT2A Q03164 2/20 0.39
MEN1 O00255 1/20 0.39
ALOX15 P16050 2/20 0.38
CA12 O43570 4/20 0.36
CA9 Q16790 4/20 0.36
TSHR P16473 3/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
MMP1 P03956 1/20 0.35
MMP2 P08253 1/20 0.35
MMP9 P14780 1/20 0.35
MMP8 P22894 1/20 0.35
MMP13 P45452 1/20 0.35
F2 P00734 1/20 0.35
PRSS1 P07477 1/20 0.35
PRSS2 P07478 1/20 0.35
PRSS3 P35030 1/20 0.35
ELANE P08246 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16020238 0.87 KDM4E (0.40) ALDH1A1KMT2AMEN1SMN1; SMN2ELANE
SCHEMBL16020253 0.86 LMNA (0.44) ALDH1A1KMT2AALOX15CA12CA9
SCHEMBL16020243 0.85 CYP2D6 (0.47) ALDH1A1KMT2ACA12CA9TSHR
SCHEMBL13079580 0.83 ALDH1A1 (0.45) ALDH1A1KMT2AMEN1ALOX15CA12
SCHEMBL16020244 0.83 ADRB2 (0.43) ALDH1A1KMT2AMEN1ALOX15TSHR
SCHEMBL20008914 0.81 PDK1 (0.32) ALDH1A1ALOX15TSHRELANEPRTN3
SCHEMBL20008933 0.81 CYP1A2 (0.33) ALDH1A1TSHRELANEPRTN3
SCHEMBL16020255 0.76 CHRM1 (0.40) ALDH1A1KMT2AMEN1SMN1; SMN2
SCHEMBL16020248 0.75 ALDH1A1 (0.44) ALDH1A1KMT2AMEN1ALOX15
SCHEMBL16020246 0.75 GABBR2 (0.41) ALDH1A1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230280651-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-07 US disclosed
US-11693314-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-07-04 US disclosed
US-20170184967-A1 RESIST COMPOSITION, PATTERN FORMING PROCESS, POLYMER, AND MONOMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-06-29 US disclosed
US-9519213-B2 Patterning process and resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-12-13 US disclosed
US-20140255843-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170184967-A1 RESIST COMPOSITION, PATTERN FORMING PROCESS, POLYMER, AND MONOMER EEF1D, EEF1G, RPL14 ALDH1A1 1397/4885KMT2A 3600/4885MEN1 844/4885
US-20230280651-A1 RESIST COMPOSITION AND PATTERNING PROCESS EIF2B1, EIF2B5, EIF2B3 ALDH1A1 3516/4885KMT2A 2222/4885MEN1 3787/4885
US-11693314-B2 Resist composition and patterning process EIF2B1, EIF2B5, EIF2B3 ALDH1A1 3516/4885KMT2A 2222/4885MEN1 3787/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.